Cyclohexanone

Cyclohexanone

SCHEMBL4579788

COC(=O)C(C)O.O=C1CCCCC1

nearest known ligand 0.46

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.46
ALDH1A1 P00352 4/20 0.44
TRIM24 O15164 2/20 0.44
TRIM33 Q9UPN9 2/20 0.44
KDM4E B2RXH2 3/20 0.36
TSHR P16473 3/20 0.36
HPGD P15428 2/20 0.36
HSD17B10 Q99714 2/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
RXFP1 Q9HBX9 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.34
POLB P06746 1/20 0.34
NPSR1 Q6W5P4 1/20 0.33
SLC6A2 P23975 2/20 0.33
SLC6A3 Q01959 2/20 0.33
SLC6A4 P31645 1/20 0.33
LMNA P02545 1/20 0.33
CA14 Q9ULX7 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclohexanone SCHEMBL2705039 0.81 CYP2D6 (0.41) THRBALDH1A1TRIM24TRIM33KDM4E
SCHEMBL28309092 0.80
Cyclohexanone SCHEMBL10004602 0.79 TRIM24 (0.52) THRBALDH1A1TRIM24TRIM33TSHR
Cyclohexanone SCHEMBL9161051 0.78 ALDH1A1 (0.65) THRBALDH1A1TRIM24TRIM33KDM4E
Cyclohexanone SCHEMBL28685491 0.78 ALDH1A1 (0.65) THRBALDH1A1TRIM24TRIM33KDM4E
SCHEMBL63918 0.78
SCHEMBL15512181 0.78 SMN1; SMN2 (0.50) ALDH1A1MEN1KMT2ASMN1; SMN2CA14
SCHEMBL65010 0.78
SCHEMBL27382 0.78
Cyclohexanone SCHEMBL17584761 0.76 ALDH1A1 (0.55) THRBALDH1A1TRIM24TRIM33KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104937006-B Photocurable composition for nanoimprint, and method for producing fine pattern substrate using same 株式会社大赛璐 2018-04-10 CN disclosed
US-7425404-B2 Chemical amplification resist composition and pattern-forming method using the same FUJIFILM CORPORATION (JP) 2008-09-16 US disclosed
US-7291441-B2 Positive resist composition and pattern forming method utilizing the same FUJIFILM CORPORATION (JP) 2007-11-06 US disclosed
US-20060046190-A1 Positive resist composition and pattern forming method utilizing the same FUJI PHOTO FILM CO., LTD. 2006-03-02 US disclosed
US-20060040208-A1 Chemical amplification resist composition and pattern-forming method using the same FUJI PHOTO FILM CO., LTD. 2006-02-23 US disclosed