Hydrochloric Acid

Hydrochloric Acid

SCHEMBL4584078

CC[Sb+2].[Cl-].[Cl-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL1627588 0.86
Propane SCHEMBL28117240 0.62
SCHEMBL179702 0.62
Propane SCHEMBL27533963 0.62
Propane SCHEMBL5168550 0.62
SCHEMBL1232556 0.62
Propane SCHEMBL21552058 0.62
Propane SCHEMBL8927329 0.62
Propane SCHEMBL28839569 0.62
Propane SCHEMBL27383381 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7390360-B2 Organometallic compounds ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-06-24 US disclosed
US-20060115595-A1 Organometallic compounds ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2006-06-01 US disclosed
EP-1645656-A1 Organometallic compounds suitable for use in vapor deposition processes Rohm and Haas Electronic Materials, L.L.C. (US) 2006-04-12 EP disclosed