SCHEMBL4584163

SCHEMBL4584163

C=CC(Br)CBr

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20979388 0.73
SCHEMBL14252471 0.69
SCHEMBL16215767 0.69
SCHEMBL7081098 0.69
SCHEMBL482706 0.69
SCHEMBL2137186 0.69
SCHEMBL4653973 0.67
SCHEMBL14025857 0.67
SCHEMBL66164 0.67
SCHEMBL8928316 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120057904-A Halogen and nitrogen element co-doped graphene composite material loading metal active site, hydrogen evolution electrode, preparation method and application 上海交通大学 2025-05-30 CN claimed
EP-0006089-B1 PREPARATION OF IMPACT RESISTANT POLYSTYRENE HAVING IMPROVED TRANSPARENCY THE DOW CHEMICAL COMPANY (US) 1983-03-02 EP claimed
EP-0006089-A1 Preparation of impact resistant polystyrene having improved transparency THE DOW CHEMICAL COMPANY (US) 1980-01-09 EP claimed
US-4100227-A Transparent impact-resistant polystyrene structure THE DOW CHEMICAL COMPANY (US) 1978-07-11 US claimed
US-4100228-A Transparent impact styrene polymer structure THE DOW CHEMICAL COMPANY (US) 1978-07-11 US claimed
CN-120057904-A Halogen and nitrogen element co-doped graphene composite material loading metal active site, hydrogen evolution electrode, preparation method and application 上海交通大学 2025-05-30 CN disclosed
US-20180223181-A1 SILOXANE MONOMER, POLYMER THEREOF, COMPOSITION CONTAINING SAID POLYMER, AND ELECTRONIC ELEMENT DAINIPPON INK & CHEMICALS (JP) 2018-08-09 US disclosed
US-20110071272-A1 FLUOROSULFONYL GROUP-CONTAINING MONOMER AND ITS POLYMER, AND SULFONIC ACID GROUP-CONTAINING POLYMER ASAHI GLASS COMPANY, LIMITED (JP) 2011-03-24 US disclosed
US-7470822-B2 2,7-Dimethyl-4-octenedial, which can be efficiently utilized in the synthesis of carotenoid compounds containing the conjugated polyene chain of beta-carotene by the double elimination reaction without going through the Ramberg-Backlund reaction; use in food additives and nutraceuticals MYONGJI UNIVERSITY INDUSTRY AND ACADEMIA COOPERATION (KR) 2008-12-30 US disclosed
US-20080262271-A1 2,7-Dimethyl-4-octenedial, which can be efficiently utilized in the synthesis of carotenoid compounds containing the conjugated polyene chain of beta-carotene by double elimination reaction without going through the Ramberg-Backlund reaction; use in food additives and nutraceuticals MYONGJI UNIVERSITY INDUSTRY AND ACADEMIA COOPERATION (KP) 2008-10-23 US disclosed
WO-2006038764-A1 ClO DIALDEHYDE, SYNTHETIC METHOD THEREOF, AND SYNTHETIC METHOD OF BETA-CAROTENE USING THE SAME KOO SANGHO (KR) 2006-04-13 WO disclosed
US-5616762-A Process for the preparation of 3-halo-and pseudohalo-alkylsilane esters HUELS AKTIENGESELLSCHAFT (DE) 1997-04-01 US disclosed
EP-0025846-A1 Improved process for the preparation of vinylcyclopropane derivatives NATIONAL DISTILLERS AND CHEMICAL CORPORATION (US) 1981-04-01 EP disclosed
US-4252739-A ALKYLATING AGENT SUCH AS 1,4-DIHALO-2-BUTENE, AN ACTIVE METHYLENE COMPOUND, A CATALYTIC ONIUM COMPOUND, AN ALKALI METAL COMPOUND AND WATER; ONE STEP EMERY INDUSTRIES, INC. (US) 1981-02-24 US disclosed
EP-0006089-A1 Preparation of impact resistant polystyrene having improved transparency THE DOW CHEMICAL COMPANY (US) 1980-01-09 EP disclosed
EP-0000554-A1 Process for the preparation of oxiranes substituted by halogen alkyl BAYER AG (DE) 1979-02-07 EP disclosed
EP-0000555-A1 Process for the preparation of oxiranes substituted by halogen alkyl BAYER AG (DE) 1979-02-07 EP disclosed
US-4132741-A Process for producing haloprene DENKA CHEMICAL CORPORATION (US) 1979-01-02 US disclosed
US-4100227-A Transparent impact-resistant polystyrene structure THE DOW CHEMICAL COMPANY (US) 1978-07-11 US disclosed
US-4100228-A Transparent impact styrene polymer structure THE DOW CHEMICAL COMPANY (US) 1978-07-11 US disclosed