⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3856009 | 0.74 | — | — | |
| SCHEMBL4585951 | 0.72 | — | — | |
| SCHEMBL6645696 | 0.68 | — | — | |
| SCHEMBL11803472 | 0.68 | — | — | |
| SCHEMBL1865306 | 0.67 | — | — | |
| SCHEMBL11802304 | 0.66 | — | — | |
| SCHEMBL2960180 | 0.65 | CYP2C19 (0.35) | — | |
| SCHEMBL9187830 | 0.65 | — | — | |
| SCHEMBL5082305 | 0.65 | TSHR (0.33) | — | |
| SCHEMBL6681852 | 0.65 | SMN1; SMN2 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1299773-A4 | SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-06-21 | — | — | EP | claimed |
| US-6783917-B2 | HIGH RESOLUTION, DIMENSIONAL STABILITY; ELECTRONIC DEVICES WITH SMALLER FEATURE SIZES | ARCH SPECIALTY CHEMICALS, INC. | 2004-08-31 | — | — | US | claimed |
| EP-1299773-A1 | SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-09 | — | — | EP | claimed |
| US-20030065101-A1 | Silicon-containing acetal protected polymers and photoresists compositions thereof | ARCH SPECIALITY CHEMICALS, INC. | 2003-04-03 | — | — | US | claimed |
| WO-2002082184-A1 | SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-10-17 | — | — | WO | claimed |
| EP-1509814-A4 | ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2008-08-27 | — | — | EP | disclosed |
| EP-1299773-A4 | SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-06-21 | — | — | EP | disclosed |
| EP-1509814-A2 | ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | Arch Specialty Chemicals, Inc. (US) | 2005-03-02 | — | — | EP | disclosed |
| US-6830870-B2 | Mixtures of addition copolymers, acid generators and solvents, used as photosensitive coatings in lithography; relief images | ARCH SPECIALITY CHEMICALS, INC. | 2004-12-14 | — | — | US | disclosed |
| US-6783917-B2 | HIGH RESOLUTION, DIMENSIONAL STABILITY; ELECTRONIC DEVICES WITH SMALLER FEATURE SIZES | ARCH SPECIALTY CHEMICALS, INC. | 2004-08-31 | — | — | US | disclosed |
| US-20040034160-A1 | Acetal protected polymers and photoresists compositions thereof | ARCH SPECIALITY CHEMICALS, INC. | 2004-02-19 | — | — | US | disclosed |
| WO-2003099782-A2 | ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-12-04 | — | — | WO | disclosed |
| EP-1299773-A1 | SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-09 | — | — | EP | disclosed |
| US-20030065101-A1 | Silicon-containing acetal protected polymers and photoresists compositions thereof | ARCH SPECIALITY CHEMICALS, INC. | 2003-04-03 | — | — | US | disclosed |
| WO-2002082184-A1 | SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-10-17 | — | — | WO | disclosed |