Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 2/20 | 0.54 |
| ▸ | CES1 | P23141 | 2/20 | 0.54 |
| ▸ | FABP3 | P05413 | 7/20 | 0.50 |
| ▸ | PPARG | P37231 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 1/20 | 0.47 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Stearic Acid SCHEMBL109141 | 1.00 | CES2 (0.54) | CES2CES1FABP3PPARGCA1 | |
| Heptanoate SCHEMBL107320 | 1.00 | CES2 (0.54) | CES2CES1FABP3PPARGCA1 | |
| Decanoic Acid SCHEMBL109283 | 1.00 | CES2 (0.54) | CES2CES1FABP3PPARGCA1 | |
| Nonanoate SCHEMBL105905 | 1.00 | CES2 (0.54) | CES2CES1FABP3PPARGCA1 | |
| Octanoic Acid SCHEMBL106093 | 1.00 | CES2 (0.54) | CES2CES1FABP3PPARGCA1 | |
| Hexanoate SCHEMBL105634 | 0.98 | CES2 (0.53) | CES2CES1FABP3PPARGCA1 | |
| Valeric Acid SCHEMBL106459 | 0.93 | CA1 (0.55) | CES2CES1FABP3PPARGCA1 | |
| Oleic Acid SCHEMBL106502 | 0.91 | FABP3 (0.67) | FABP3PPARGEPHX2 | |
| Oleic Acid SCHEMBL106504 | 0.91 | FABP3 (0.67) | FABP3PPARGEPHX2 | |
| Adipic Acid SCHEMBL108681 | 0.89 | HDAC1 (0.55) | CES2CES1CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1509814-A4 | ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2008-08-27 | — | — | EP | disclosed |
| EP-1656590-A2 | NOVEL PHOTOSENSITIVE BILAYER COMPOSITION | FujiFilm Electronic Materials USA, Inc. (US) | 2006-05-17 | — | — | EP | disclosed |
| US-6929897-B2 | Photosensitive bilayer composition | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-08-16 | — | — | US | disclosed |
| WO-2005022257-A2 | NOVEL PHOTOSENSITIVE BILAYER COMPOSITION | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-03-10 | — | — | WO | disclosed |
| EP-1509814-A2 | ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | Arch Specialty Chemicals, Inc. (US) | 2005-03-02 | — | — | EP | disclosed |
| US-20050042542-A1 | Novel photosensitive bilayer composition | ARCH SPECIALTY CHEMICALS, INC. | 2005-02-24 | — | — | US | disclosed |
| US-6830870-B2 | Mixtures of addition copolymers, acid generators and solvents, used as photosensitive coatings in lithography; relief images | ARCH SPECIALITY CHEMICALS, INC. | 2004-12-14 | — | — | US | disclosed |
| US-20040034160-A1 | Acetal protected polymers and photoresists compositions thereof | ARCH SPECIALITY CHEMICALS, INC. | 2004-02-19 | — | — | US | disclosed |
| WO-2003099782-A2 | ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-12-04 | — | — | WO | disclosed |