Anthracene

Anthracene

SCHEMBL458809

CO.c1ccc2cc3ccccc3cc2c1

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 7/20 0.50
CYP1A2 P05177 5/20 0.50
TDP1 Q9NUW8 2/20 0.50
ALOX12 P18054 1/20 0.50
ALDH1A1 P00352 4/20 0.48
CYP3A4 P08684 2/20 0.48
HSD17B10 Q99714 2/20 0.48
ALOX15 P16050 1/20 0.48
CASP1 P29466 1/20 0.48
CASP7 P55210 1/20 0.48
HBB P68871 1/20 0.48
HIF1A Q16665 1/20 0.48
GLA P06280 1/20 0.47
MAPT P10636 1/20 0.47
HPGD P15428 1/20 0.47
ACHE P22303 1/20 0.47
UGT2B7 P16662 1/20 0.46
NQO2 P16083 1/20 0.45
KDM4E B2RXH2 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benz(B)Anthracene SCHEMBL29021080 0.96 ALDH1A1 (0.52) CYP2A6CYP1A2TDP1ALOX12ALDH1A1
Anthracene SCHEMBL18037719 0.88 CYP2A6 (0.54) CYP2A6CYP1A2TDP1ALOX12ALDH1A1
Anthracene SCHEMBL29352043 0.88 CYP2A6 (0.64) CYP2A6CYP1A2TDP1ALOX12ALDH1A1
Anthracene SCHEMBL5713429 0.88 CYP2A6 (0.64) CYP2A6CYP1A2TDP1ALOX12ALDH1A1
Anthracene SCHEMBL7703 0.88 CYP2A6 (0.64) CYP2A6CYP1A2TDP1ALOX12ALDH1A1
Anthracene SCHEMBL2833889 0.88 CYP2A6 (0.64) CYP2A6CYP1A2TDP1ALOX12ALDH1A1
Anthracene SCHEMBL6313219 0.85 CYP2A6 (0.50) CYP2A6CYP1A2TDP1ALOX12ALDH1A1
Anthracene SCHEMBL27881529 0.85 CYP2A6 (0.50) CYP2A6CYP1A2TDP1ALOX12ALDH1A1
Anthracene SCHEMBL10405277 0.85 ALDH1A1 (0.55) CYP2A6CYP1A2TDP1ALOX12ALDH1A1
Anthracene SCHEMBL6738032 0.85 CYP2A6 (0.50) CYP2A6CYP1A2TDP1ALOX12ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 158 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118291044-A Reversible acrylate adhesive with excellent secondary bonding strength, and preparation method, using method and application thereof 郑州大学 2024-07-05 CN claimed
CN-118222171-A Nanometer stamping adhesive for improving adhesive force of glass-based circuit and circuit manufacturing method based on glass substrate 深圳市百柔新材料技术有限公司 2024-06-21 CN claimed
CN-113035408-B Solar cell grid line slurry and preparation method thereof, and solar cell 深圳市百柔新材料技术有限公司 2024-02-02 CN claimed
CN-114031544-B Substituted maleimide fluorescent compound, and preparation and application thereof 中山大学 2023-10-20 CN claimed
CN-116895750-A Silicon-carbon negative electrode material with high cycle stability and preparation method and application thereof 浙江锂宸新材料科技有限公司 2023-10-17 CN claimed
CN-110343202-B Preparation method of photo-repairable azobenzene polymer 常州大学 2021-03-23 CN claimed
US-9728220-B2 Charge control agent for fluid dynamic bearing motor lubricant WESTERN DIGITAL TECHNOLOGIES, INC. (US) 2017-08-08 US claimed
US-20160260453-A1 CHARGE CONTROL AGENT FOR FLUID DYNAMIC BEARING MOTOR LUBRICANT HGST Netherlands B.V. 2016-09-08 US claimed
US-9368150-B2 Charge control agent for fluid dynamic bearing motor lubricant HGST Netherlands B.V. (NL) 2016-06-14 US claimed
US-20160086631-A1 CHARGE CONTROL AGENT FOR FLUID DYNAMIC BEARING MOTOR LUBRICANT HGST Netherlands B.V. (NL) 2016-03-24 US claimed
US-20030087180-A1 Photoresist composition for deep UV radiation containing an additive AZ ELECTRONIC MATERIALS USA CORP. 2003-05-08 US claimed
US-6303263-B1 Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups INTERNATIONAL BUSINESS MACHINES MACHINES 2001-10-16 US claimed
US-6187505-B1 MIXTURE COMPRISING POLYSILSESQUIOXANE HAVING PHENOLIC GROUPS CROSSLINKABLE WITH ACID CATALYZABLE CURING AGENT, ACID GENERATOR, PHOTOSENSITIZER, A BASE AND SURFACTANT; PATTERN RESOLUTION WITH HIGH ASPECT RATIO INTERNATIONAL BUSINESS MACHINES CORPORATION 2001-02-13 US claimed
US-6103447-A Approach to formulating irradiation sensitive positive resists INTERNATIONAL BUSINESS MACHINES CORP. (US) 2000-08-15 US claimed
EP-0543761-B1 Crosslinkable aqueous developable photoresist compositions IBM (US) 2000-06-14 EP claimed
EP-0543762-B1 Dry developable photoresist compositions and method for use thereof IBM (US) 2000-02-16 EP claimed
US-5322765-A Dry developable photoresist compositions and method for use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-06-21 US claimed
US-5296332-A Crosslinkable aqueous developable photoresist compositions and method for use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-03-22 US claimed
EP-0543762-A1 Dry developable photoresist compositions and method for use thereof International Business Machines Corporation (US) 1993-05-26 EP claimed
EP-0543761-A1 Crosslinkable aqueous developable photoresist compositions and method for use thereof International Business Machines Corporation (US) 1993-05-26 EP claimed