SCHEMBL4591975

SCHEMBL4591975

C=CC(=O)CN(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30040754 0.79
SCHEMBL3085728 0.77 ALDH1A1 (0.62)
SCHEMBL3085730 0.75 ALDH1A1 (0.38)
SCHEMBL10403868 0.74
SCHEMBL1059458 0.74
SCHEMBL10402987 0.72
SCHEMBL28602298 0.71 KMT2A (0.41)
SCHEMBL11703841 0.70 TSHR (0.42)
SCHEMBL13318696 0.70 STAT3 (0.33)
Acrylamide SCHEMBL11476104 0.70 ALDH1A1 (0.58)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113423747-B Curable composition 韩国科泽新材料株式会社 2024-04-12 CN claimed
CN-116693873-A Hyperbranched polymer high-temperature-resistant high-salt-resistant filtrate reducer, and preparation method and application thereof 长江大学 2023-09-05 CN claimed
EP-4047066-A1 CURABLE COMPOSITION Koza Novel Materials Korea Co., Ltd. (KR) 2022-08-24 EP claimed
US-20220162359-A1 Curable Composition LG CHEM, LTD. (KR) 2022-05-26 US claimed
CN-113423747-A Curable composition 株式会社LG化学 2021-09-21 CN claimed
WO-2021075901-A1 CURABLE COMPOSITION 주식회사 엘지화학 2021-04-22 WO claimed
CN-117924628-A Method for producing sulfonic anion resin, and anion exchange membrane 惠州亿纬氢能有限公司 2024-04-26 CN disclosed
CN-113423747-B Curable composition 韩国科泽新材料株式会社 2024-04-12 CN disclosed
CN-116693873-A Hyperbranched polymer high-temperature-resistant high-salt-resistant filtrate reducer, and preparation method and application thereof 长江大学 2023-09-05 CN disclosed
EP-4047066-A1 CURABLE COMPOSITION Koza Novel Materials Korea Co., Ltd. (KR) 2022-08-24 EP disclosed
US-20220162359-A1 Curable Composition LG CHEM, LTD. (KR) 2022-05-26 US disclosed
CN-114302705-A Cosmetic composition and use thereof 大自然化妆品股份有限公司 2022-04-08 CN disclosed
CN-113423747-A Curable composition 株式会社LG化学 2021-09-21 CN disclosed
EP-1937688-A1 IMIDAZO BENZODIAZEPINE DERIVATIVES F.HOFFMANN-LA ROCHE AG (CH) 2008-07-02 EP disclosed
US-20070231720-A1 ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR, IMAGE FORMING METHOD, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE RICOH COMPANY, LTD. (JP) 2007-10-04 US disclosed
WO-2007042421-A1 IMIDAZO BENZODIAZEPINE DERIVATIVES F. HOFFMANN-LA ROCHE AG (CH) 2007-04-19 WO disclosed
WO-1992017452-A1 2-QUINOLINONE DERIVATIVES KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) 1992-10-15 WO disclosed
US-4112207-A Radiation-curable polymers bearing quaternary nitrogen groups THE DOW CHEMICAL COMPANY (US) 1978-09-05 US disclosed
US-4044054-A 2-Oxo-3-alkenyl dimethylamine CALGON CORPORATION (US) 1977-08-23 US disclosed
US-4044054-A 2-Oxo-3-alkenyl dimethylamine CALGON CORPORATION (US) 1977-08-23 US disclosed