SCHEMBL4592337

SCHEMBL4592337

Clc1cccc([S+](c2cccc(Cl)c2)c2cccc(Cl)c2)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.46
TSHR P16473 2/20 0.46
PNMT P11086 2/20 0.41
CHRM5 P08912 1/20 0.39
TAAR1 Q96RJ0 2/20 0.38
PARP1 P09874 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
MAPT P10636 2/20 0.37
CYP3A4 P08684 2/20 0.37
IDO1 P14902 2/20 0.37
AGXT P21549 2/20 0.37
ALOX5 P09917 1/20 0.37
MGLL Q99685 1/20 0.37
HTR3E A5X5Y0 1/20 0.37
SLC22A2 O15244 1/20 0.37
SLC22A1 O15245 1/20 0.37
SLC22A3 O75751 1/20 0.37
HTR3B O95264 1/20 0.37
PLAU P00749 1/20 0.37
HTR3A P46098 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29404327 0.93 TSHR (0.46) ALDH1A1TSHRPNMTCHRM5TAAR1
SCHEMBL2197905 0.79 ALDH1A1 (0.42) ALDH1A1TSHRPNMTCHRM5TAAR1
SCHEMBL29404871 0.79 ALDH1A1 (0.42) ALDH1A1TSHRPNMTCHRM5TAAR1
SCHEMBL18331401 0.77 ALDH1A1 (0.41) ALDH1A1TSHRPNMTCHRM5TAAR1
SCHEMBL9222001 0.75 ALDH1A1 (0.39) ALDH1A1TSHRPNMTCHRM5TAAR1
SCHEMBL29726985 0.75 ALDH1A1 (0.39) ALDH1A1TSHRPNMTCHRM5TAAR1
SCHEMBL15109021 0.75 ALDH1A1 (0.39) ALDH1A1TSHRPNMTCHRM5TAAR1
SCHEMBL20048841 0.75 ALDH1A1 (0.39) ALDH1A1TSHRPNMTCHRM5TAAR1
SCHEMBL8274402 0.75 ALDH1A1 (0.44) ALDH1A1TSHRPNMTCHRM5TAAR1
SCHEMBL20048803 0.75 ALDH1A1 (0.44) ALDH1A1TSHRPNMTCHRM5TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161249-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND FUJIFILM CORPORATION (JP) 2023-05-25 US disclosed
US-20230161249-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND FUJIFILM CORPORATION (JP) 2023-05-25 US disclosed
US-20210165325-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND FUJIFILM CORPORATION (JP) 2021-06-03 US disclosed
US-8110337-B2 Mixture of binder, an unsaturated compound and acid generator; lithography FUJIFILM CORPORATION (JP) 2012-02-07 US disclosed
US-7442485-B2 Lithographic process involving on press development FUJIFILM CORPORATION (JP) 2008-10-28 US disclosed
US-20070229637-A1 Ink set for ink-jet recording and ink-jet recording method FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
EP-1484177-B1 Lithographic process involving on press development FUJIFILM CORP (JP) 2007-08-29 EP disclosed
US-20050016402-A1 Lithographic process involving on press development FUJI PHOTO FILM CO., LTD. 2005-01-27 US disclosed
EP-1484177-A2 Lithographic process involving on press development FUJI PHOTO FILM CO., LTD. (JP) 2004-12-08 EP disclosed