SCHEMBL4594585

SCHEMBL4594585

C=C(C)C(=O)OC(c1ccccc1)C(C)C

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.43
ELANE P08246 1/20 0.41
CYP3A4 P08684 2/20 0.41
TACR3 P29371 4/20 0.40
ALDH1A1 P00352 2/20 0.40
HCAR2 Q8TDS4 1/20 0.39
KMT2A Q03164 1/20 0.38
LMNA P02545 2/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
NPSR1 Q6W5P4 2/20 0.37
ATM Q13315 2/20 0.37
MAPT P10636 1/20 0.37
XBP1 P17861 1/20 0.37
ESR1 P03372 1/20 0.37
ESR2 Q92731 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.36
HTT P42858 1/20 0.36
KLK7 P49862 1/20 0.36
CYP2D6 P10635 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5580232 0.84 ALDH1A1 (0.45) HPGDELANECYP3A4ALDH1A1HCAR2
SCHEMBL26816157 0.83 ACACB (0.36) ELANEALDH1A1
Hydrochloric Acid SCHEMBL1363430 0.83 ALDH1A1 (0.44) HPGDELANECYP3A4ALDH1A1HCAR2
SCHEMBL5091148 0.83 HPGD (0.38) HPGDELANECYP3A4TACR3ALDH1A1
SCHEMBL10907558 0.82 HCAR2 (0.53) HPGDELANECYP3A4ALDH1A1HCAR2
SCHEMBL41864 0.82 HCAR2 (0.53) HPGDELANECYP3A4ALDH1A1HCAR2
SCHEMBL16729219 0.82 CYP3A4 (0.53) CYP3A4TACR3ALDH1A1HCAR2KMT2A
SCHEMBL1131746 0.82 ESR1 (0.49) HPGDELANECYP3A4ALDH1A1HCAR2
SCHEMBL765776 0.82 CYP3A4 (0.53) CYP3A4TACR3ALDH1A1HCAR2KMT2A
SCHEMBL1437800 0.80 ALDH1A1 (0.47) HPGDELANECYP3A4ALDH1A1HCAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101467101-A Lithographic plate material KONICA MINOLTA MED & GRAPHIC (JP) 2009-06-24 CN disclosed
EP-0843218-B1 Photosensitive composition FUJIFILM CORP (JP) 2008-01-16 EP disclosed
US-6746812-B2 USING A FLUORINE-CONTAINING POLYMER IN THE PHOTOSENSITIVE RESIN COMPOSITION TO GIVE HIGH CONTRAST OF PRINTING PLATE IMAGE WHILE MAINTAINING PRESS LIFE FUJI PHOTO FILM CO., LTD. (JP) 2004-06-08 US disclosed
EP-1314552-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2003-05-28 EP disclosed
EP-0949539-B1 Photosensitive resin composition FUJI PHOTO FILM CO LTD (JP) 2003-03-19 EP disclosed
EP-1225478-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2002-07-24 EP disclosed
US-6423467-B1 USEFUL IN A LITHOGRAPHIC PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 2002-07-23 US disclosed
US-20020086233-A1 Useful in a lithographic printing plates FUJIFILM CORPORATION (JP) 2002-07-04 US disclosed
US-20020051929-A1 Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life FUJIFILM CORPORATION (JP) 2002-05-02 US disclosed
US-6132931-A A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US disclosed
US-6110640-A Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-08-29 US disclosed
EP-0949539-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-13 EP disclosed
EP-0843218-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1998-05-20 EP disclosed