Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 2/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.51 |
| ▸ | ATM | Q13315 | 1/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | XBP1 | P17861 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.44 |
| ▸ | ACR | P10323 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | RXRA | P19793 | 1/20 | 0.41 |
| ▸ | RXRB | P28702 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11555462 | 0.91 | KMT2A (0.48) | ELANEKMT2AATMSMN1; SMN2HPGD | |
| SCHEMBL15221808 | 0.87 | ELANE (0.54) | ELANEKMT2AATMSMN1; SMN2HPGD | |
| SCHEMBL18061417 | 0.87 | ELANE (0.57) | ELANEKMT2AATMSMN1; SMN2MAPT | |
| SCHEMBL56436 | 0.86 | ELANE (0.69) | ELANEKMT2AATMSMN1; SMN2HPGD | |
| SCHEMBL13888358 | 0.86 | ELANE (0.53) | ELANEKMT2AATMSMN1; SMN2HPGD | |
| SCHEMBL19017564 | 0.85 | ELANE (0.56) | ELANEKMT2AATMSMN1; SMN2HPGD | |
| SCHEMBL9577312 | 0.85 | SMN1; SMN2 (0.51) | ELANEKMT2ASMN1; SMN2HPGDXBP1 | |
| SCHEMBL9576707 | 0.84 | SMN1; SMN2 (0.47) | ELANEKMT2ASMN1; SMN2HPGDXBP1 | |
| SCHEMBL587543 | 0.83 | ESR1 (0.52) | ELANEKMT2AATMSMN1; SMN2XBP1 | |
| SCHEMBL22074734 | 0.83 | ELANE (0.50) | ELANEKMT2AATMSMN1; SMN2MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114013386-B | Stamping, in particular for permanently closing holes | 德莎欧洲股份公司 | 2024-04-16 | — | — | CN | disclosed |
| CN-117481989-A | Cosmetic composition capable of forming a multilayer structure after application to keratin materials | 莱雅公司 | 2024-02-02 | — | — | CN | disclosed |
| US-20230348635-A1 | POLYMERIC RESIN FOR DIELECTRIC APPLICATIONS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-11-02 | — | — | US | disclosed |
| CN-116549308-A | Cosmetic composition capable of forming a multilayer structure after application to keratin materials | 莱雅公司 | 2023-08-08 | — | — | CN | disclosed |
| CN-116426229-A | Poly (meth) acrylate-based pressure sensitive adhesives comprising at least one acrylonitrile-butadiene rubber | 德莎欧洲股份公司 | 2023-07-14 | — | — | CN | disclosed |
| CN-116333634-A | Separable laminate and method for separating long-term adhesion | 德莎欧洲股份公司 | 2023-06-27 | — | — | CN | disclosed |
| CN-111432795-B | Cosmetic composition capable of forming a multilayer structure after application to keratin materials | 莱雅公司 | 2023-06-20 | — | — | CN | disclosed |
| CN-111533668-A | Cyanostilbenes | 罗利克技术有限公司 | 2020-08-14 | — | — | CN | disclosed |
| EP-3636720-A1 | USE OF A THICKENED ALCOHOLIC COMPOSITION FOR VERTICAL, BUBBLE-FREE ADHESION OF SUBSTRATES AND METHOD FOR VERTICALLY JOINING TWO SUBSTRATES | tesa SE (DE) | 2020-04-15 | — | — | EP | disclosed |
| EP-3633002-A2 | METHOD FOR APPLYING STAMPED PARTS TO SURFACES AND TEST METHOD FOR SAME | tesa SE (DE) | 2020-04-08 | — | — | EP | disclosed |
| EP-1314552-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-05-28 | — | — | EP | disclosed |
| EP-0949539-B1 | Photosensitive resin composition | FUJI PHOTO FILM CO LTD (JP) | 2003-03-19 | — | — | EP | disclosed |
| EP-1225478-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-24 | — | — | EP | disclosed |
| US-6423467-B1 | USEFUL IN A LITHOGRAPHIC PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-23 | — | — | US | disclosed |
| US-20020086233-A1 | Useful in a lithographic printing plates | FUJIFILM CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| US-20020051929-A1 | Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life | FUJIFILM CORPORATION (JP) | 2002-05-02 | — | — | US | disclosed |
| US-6132931-A | A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 2000-10-17 | — | — | US | disclosed |
| US-6110640-A | Photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2000-08-29 | — | — | US | disclosed |
| EP-0949539-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0843218-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |