Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 4/20 | 0.52 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.52 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.52 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.52 |
| ▸ | ELANE | P08246 | 5/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | ATM | Q13315 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | PPARG | P37231 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL72362 | 0.88 | ELANE (0.61) | ESR1ESR2ELANEKMT2AATM | |
| SCHEMBL4332836 | 0.83 | ELANE (0.50) | ESR1ESR2ELANEKMT2AATM | |
| SCHEMBL13595800 | 0.83 | ESR1 (0.59) | ESR1ESR2PDCD1CD274ELANE | |
| SCHEMBL217004 | 0.83 | ELANE (0.56) | ESR1ESR2ELANEKMT2AATM | |
| SCHEMBL14242097 | 0.83 | ESR1 (0.59) | ESR1ESR2PDCD1CD274ELANE | |
| SCHEMBL4594842 | 0.83 | ELANE (0.56) | ESR1ELANEKMT2AATMMAPT | |
| Methacrylic Acid SCHEMBL8512987 | 0.83 | ELANE (0.60) | ESR1ESR2ELANEKMT2AATM | |
| SCHEMBL15221808 | 0.81 | ELANE (0.54) | ESR1ELANEKMT2AATMMAPT | |
| SCHEMBL27243146 | 0.81 | ELANE (0.54) | ESR2ELANEKMT2AATMMAPT | |
| SCHEMBL18061417 | 0.81 | ELANE (0.57) | ESR1ELANEKMT2AATMMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2236647-B1 | PROCESS FOR ADSORBING PLATING CATALYSTS, PROCESS FOR PRODUCTION OF SUBSTRATES PROVIDED WITH METAL LAYERS AND PLATING CATALYST CONTAINING FLUID FOR USE IN BOTH PROCESSES | FUJIFILM CORP (JP) | 2018-02-21 | — | — | EP | disclosed |
| EP-2247171-B1 | METAL-CLAD SUBSTRATE, AND METHOD FOR PRODUCTION THEREOF | FUJIFILM CORP (JP) | 2015-04-22 | — | — | EP | disclosed |
| US-8273463-B2 | Multilayer film for plating, method of manufacturing metal film-coated material and metal film-coated material | FUJIFILM CORPORATION (JP) | 2012-09-25 | — | — | US | disclosed |
| EP-2105451-B1 | Nitrile group-containing polymer and method of synthesizing the same, composition containing nitrile group-containing polymer, and laminate | FUJIFILM CORP (JP) | 2012-02-15 | — | — | EP | disclosed |
| US-20100279012-A1 | METHOD FOR ADSORBING PLATING CATALYST, METHOD FOR PREPARING SUBSTRATE PROVIDED WITH METAL LAYER, AND PLATING CATALYST SOLUTION USED IN THE SAME | FUJIFILM CORPORATION (JP) | 2010-11-04 | — | — | US | disclosed |
| EP-2247171-A1 | METAL-CLAD SUBSTRATE, AND METHOD FOR PRODUCTION THEREOF | FUJIFILM Corporation (JP) | 2010-11-03 | — | — | EP | disclosed |
| US-20100273014-A1 | METAL-CLAD SUBSTRATE, AND METHOD FOR PRODUCTION THEREOF | FUJIFILM CORPORATION (JP) | 2010-10-28 | — | — | US | disclosed |
| US-20100272902-A1 | PLATING METHOD, METHOD FOR FORMING METAL THIN FILM, AND PLATING CATALYST LIQUID | FUJIFILM CORPORATION (JP) | 2010-10-28 | — | — | US | disclosed |
| EP-2236647-A1 | PROCESS FOR ADSORBING PLATING CATALYSTS, PROCESS FOR PRODUCTION OF SUBSTRATES PROVIDED WITH METAL LAYERS AND PLATING CATALYST CONTAINING FLUID FOR USE IN BOTH PROCESSES | FUJIFILM Corporation (JP) | 2010-10-06 | — | — | EP | disclosed |
| EP-2230328-A1 | PLATING METHOD, METHOD FOR FORMING METAL THIN FILM, AND PLATING CATALYST LIQUID | FUJIFILM Corporation (JP) | 2010-09-22 | — | — | EP | disclosed |
| US-20100113264-A1 | CONDUCTIVE SUBSTANCE-ADSORBING RESIN FILM, METHOD FOR PRODUCING CONDUCTIVE SUBSTANCE-ADSORBING RESIN FILM, METAL LAYER-COATED RESIN FILM USING THE SAME, AND METHOD FOR PRODUCING METAL LAYER-COATED RESIN FILM | FUJIFILM CORPORATION (JP) | 2010-05-06 | — | — | US | disclosed |
| US-20100003533-A1 | METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2010-01-07 | — | — | US | disclosed |
| EP-2133200-A1 | CONDUCTIVE-SUBSTANCE-ADSORBING RESIN FILM, PROCESS FOR PRODUCING CONDUCTIVE-SUBSTANCE-ADSORBING RESIN FILM, METAL-LAYER-COATED RESIN FILM MADE FROM THE SAME, AND PROCESS FOR PRODUCING METAL-LAYER-COATED RESIN FILM | Fujifilm Corporation (JP) | 2009-12-16 | — | — | EP | disclosed |
| US-20090269599-A1 | MULTILAYER FILM FOR PLATING, METHOD OF MANUFACTURING METAL FILM-COATED MATERIAL AND METAL FILM-COATED MATERIAL | FUJIFILM CORPORATION (JP) | 2009-10-29 | — | — | US | disclosed |
| EP-2105451-A2 | Nitrile group-containing polymer and method of synthesizing the same, composition containing nitrile group-containing polymer, and laminate | Fujifilm Corporation (JP) | 2009-09-30 | — | — | EP | disclosed |
| US-20090214876-A1 | METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2009-08-27 | — | — | US | disclosed |
| EP-2078607-A1 | METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE POLYMER, AND LAYERED PRODUCT | FUJIFILM Corporation (JP) | 2009-07-15 | — | — | EP | disclosed |
| US-20090155553-A1 | Method of manufacturing surface metal film material, surface metal film material, method of manufacturing patterned metal material, patterned metal material, and polymer layer-forming composition | FUJIFILM CORPORATION (JP) | 2009-06-18 | — | — | US | disclosed |