SCHEMBL4596261

SCHEMBL4596261

C=[C]CCOCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16736399 0.73
SCHEMBL15536151 0.71
SCHEMBL6327734 0.71
SCHEMBL8173311 0.71
SCHEMBL193101 0.71
SCHEMBL9734254 0.71
SCHEMBL1146009 0.71
Ether SCHEMBL277568 0.70
SCHEMBL22247 0.69
SCHEMBL19970453 0.69 ALDH1A1 (0.60)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114209702-A Pharmaceutical composition of nilotinib 太阳制药工业公司 2022-03-22 CN disclosed
US-11046803-B2 Block copolymer and surface treatment agent using same TOSOH CORPORATION (JP) 2021-06-29 US disclosed
US-20190194376-A1 BLOCK COPOLYMER AND SURFACE TREATMENT AGENT USING SAME TOSOH CORPORATION (JP) 2019-06-27 US disclosed
US-7432502-B2 Information acquisition method and apparatus for information acquisition CANON KABUSHIKI KAISHA (JP) 2008-10-07 US disclosed
EP-0843218-B1 Photosensitive composition FUJIFILM CORP (JP) 2008-01-16 EP disclosed
US-20060169918-A1 Information acquistion method and apparatus for information acquistion CANON KABUSHIKI KAISHA (JP) 2006-08-03 US disclosed
US-20050176846-A1 Ink composition, process for producing the same, method of forming image therewith and image forming device CANON KABUSHIKI KAISHA (JP) 2005-08-11 US disclosed
WO-2004079344-A1 INFORMATION ACQUISITION METHOD AND APPARATUS FOR INFORMATION ACQUISITION CANON KABUSHIKI KAISHA (JP) 2004-09-16 WO disclosed
EP-1314552-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2003-05-28 EP disclosed