SCHEMBL4598392

SCHEMBL4598392

Oc1cccc(-c2ccc(O)c(O)c2O)c1O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 7/20 0.55
HSD17B10 Q99714 7/20 0.55
ALDH1A1 P00352 6/20 0.55
ALOX15 P16050 6/20 0.55
RECQL P46063 4/20 0.55
LMNA P02545 4/20 0.55
TDP1 Q9NUW8 4/20 0.55
CA2 P00918 3/20 0.55
CA1 P00915 2/20 0.55
CDK2 P24941 2/20 0.55
EGFR P00533 2/20 0.55
FYN P06241 2/20 0.55
MMP9 P14780 2/20 0.55
ADAMTS4 O75173 1/20 0.55
MMP2 P08253 1/20 0.55
MMP8 P22894 1/20 0.55
CA6 P23280 1/20 0.55
MMP12 P39900 1/20 0.55
ADAMTS5 Q9UNA0 1/20 0.55
DBH P09172 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30394650 1.00 HPGD (0.55) HPGDHSD17B10ALDH1A1ALOX15RECQL
SCHEMBL337585 0.89 ALDH1A1 (0.69) HPGDHSD17B10ALDH1A1ALOX15RECQL
SCHEMBL29453072 0.89 ALDH1A1 (0.69) HPGDHSD17B10ALDH1A1ALOX15RECQL
SCHEMBL18948647 0.86 HPGD (0.50) HPGDHSD17B10ALDH1A1ALOX15RECQL
SCHEMBL29737462 0.86 ALDH1A1 (0.44) HPGDHSD17B10ALDH1A1ALOX15RECQL
SCHEMBL1883019 0.86 ALDH1A1 (0.44) HPGDHSD17B10ALDH1A1ALOX15RECQL
SCHEMBL9973588 0.83 HPGD (0.61) HPGDHSD17B10ALDH1A1ALOX15RECQL
SCHEMBL79393 0.81 HPGD (0.58) HPGDHSD17B10ALDH1A1ALOX15RECQL
Boric Acid SCHEMBL29771843 0.81 HPGD (0.58) HPGDHSD17B10ALDH1A1ALOX15RECQL
SCHEMBL13992463 0.79 HPGD (0.55) HPGDHSD17B10ALDH1A1ALOX15RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119998398-A Aromatic polycarbonate resin composition and molded article thereof 帝人株式会社 2025-05-13 CN disclosed
CN-119948103-A Resin composition and molded article thereof 帝人株式会社 2025-05-06 CN disclosed
CN-119923444-A Thermoplastic resin composition and molded article comprising the same 帝人株式会社 2025-05-02 CN disclosed
CN-119365538-A Polycarbonate resin composition and molded article comprising the same 帝人株式会社 2025-01-24 CN disclosed
EP-3730638-B1 A SINTERED BODY DAINIPPON INK & CHEMICALS (JP) 2024-08-14 EP disclosed
CN-112689800-B Photosensitive resin composition for forming permanent film, cured film, electronic device, and method for producing same 住友电木株式会社 2024-07-30 CN disclosed
CN-117203255-A Polyurethane and moisture curable composition comprising the same H.B.富乐公司 2023-12-08 CN disclosed
CN-114072461-B Thermoplastic resin composition, molded article and product 三菱电机株式会社 2023-11-14 CN disclosed
CN-113383035-B Molding material comprising carbon fiber-reinforced polycarbonate resin composition 帝人株式会社 2023-08-01 CN disclosed
CN-113557270-B Impeller and resin composition thereof 帝人株式会社 2023-07-28 CN disclosed
WO-2014118163-A2 AQUEOUS ADHESIVE COMPOSITION FOR THE BONDING OF WOOD COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN (FR) 2014-08-07 WO disclosed
WO-2014111440-A2 AQUEOUS POLYALDEHYDE AND POLYPHENOL ADHESIVE COMPOSITION COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN (FR) 2014-07-24 WO disclosed
EP-1877865-A2 NANOCOMPOSITE PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS AZ Electronic Materials USA Corp. (US) 2008-01-16 EP disclosed
WO-2006109185-A2 NANOCOMPOSITE PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2006-10-19 WO disclosed
EP-1497368-A1 NOVOLAK RESIN MIXTURES AND PHOTOSENSITIVE COMPOSITIONS COMPRISING THE SAME Clariant International Ltd. (CH) 2005-01-19 EP disclosed
WO-2003085045-A1 NOVOLAK RESIN MIXTURES AND PHOTOSENSITIVE COMPOSITIONS COMPRISING THE SAME CLARIANT INTERNATIONAL LTD (CH) 2003-10-16 WO disclosed
EP-0530148-B1 Positive photo resist with increased dissolving power and reduced crystallisation tendency as well as new tetra(hydroxyphenyl)alkane OLIN MICROELECTRONIC CHEM INC (US) 1998-12-23 EP disclosed
US-5554797-A ENHANCE PHOTOSENSITIVITY AND/OR RATE OF DEVELOPMENT OF PHOTORESISTS OCG MICROELECTRONIC MATERIALS, INC. (US) 1996-09-10 US disclosed
US-5296330-A Resolution, amorphous CIBA-GEIGY CORP. (US) 1994-03-22 US disclosed
EP-0530148-A1 Positive photo resist with increased dissolving power and reduced crystallisation tendency as well as new tetra(hydroxyphenyl)alkane OCG Microelectronic Materials Inc. (US) 1993-03-03 EP disclosed