Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.81 |
| ▸ | MAPT | P10636 | 3/20 | 0.81 |
| ▸ | CA12 | O43570 | 3/20 | 0.81 |
| ▸ | CA1 | P00915 | 3/20 | 0.81 |
| ▸ | CA2 | P00918 | 3/20 | 0.81 |
| ▸ | CA7 | P43166 | 3/20 | 0.81 |
| ▸ | CA9 | Q16790 | 3/20 | 0.81 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.81 |
| ▸ | LMNA | P02545 | 3/20 | 0.81 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.81 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.81 |
| ▸ | CA4 | P22748 | 2/20 | 0.81 |
| ▸ | CA6 | P23280 | 2/20 | 0.81 |
| ▸ | FUT7 | Q11130 | 2/20 | 0.81 |
| ▸ | TP53 | P04637 | 1/20 | 0.81 |
| ▸ | CA3 | P07451 | 1/20 | 0.81 |
| ▸ | SELL | P14151 | 1/20 | 0.81 |
| ▸ | HPGD | P15428 | 1/20 | 0.81 |
| ▸ | SELP | P16109 | 1/20 | 0.81 |
| ▸ | FUT4 | P22083 | 1/20 | 0.81 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Gallic Acid SCHEMBL3515851 | 1.00 | KDM4E (0.81) | KDM4EMAPTCA12CA1CA2 | |
| Gallic Acid SCHEMBL7775754 | 0.91 | KDM4E (0.74) | KDM4EMAPTCA12CA1CA2 | |
| Gallic Acid SCHEMBL5874968 | 0.91 | KDM4E (0.74) | KDM4EMAPTCA12CA1CA2 | |
| Gallic Acid SCHEMBL15012 | 0.90 | CA12 (1.00) | KDM4EMAPTCA12CA1CA2 | |
| Gallic Acid SCHEMBL1845406 | 0.90 | CA12 (1.00) | KDM4EMAPTCA12CA1CA2 | |
| Gallic Acid SCHEMBL30375631 | 0.90 | CA12 (1.00) | KDM4EMAPTCA12CA1CA2 | |
| Gallic Acid SCHEMBL4918056 | 0.90 | CA12 (1.00) | KDM4EMAPTCA12CA1CA2 | |
| Gallic Acid SCHEMBL8088102 | 0.90 | CA12 (1.00) | KDM4EMAPTCA12CA1CA2 | |
| Gallic Acid SCHEMBL678990 | 0.90 | CA12 (1.00) | KDM4EMAPTCA12CA1CA2 | |
| Gallic Acid SCHEMBL29484566 | 0.90 | CA12 (1.00) | KDM4EMAPTCA12CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5501708-A | POLYOL ESTER OF GALLIC, TRIMELLITIC, PYROMELLITIC OR BENZOPHENONETETRACARBOXYLIC ACID | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 1996-03-26 | — | — | US | claimed |
| WO-1992018457-A1 | PROCESS FOR TANNING HIDES AND COMPOUNDS FOR USE THEREIN | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 1992-10-29 | — | — | WO | claimed |
| EP-4702010-A1 | PHOTOACTIVE COMPOUNDS | Merck Patent GmbH (DE) | 2026-03-04 | — | — | EP | disclosed |
| WO-2024223739-A1 | PHOTOACTIVE COMPOUNDS | MERCK PATENT GMBH (DE) | 2024-10-31 | — | — | WO | disclosed |
| WO-2024185652-A1 | RESIN COMPOSITION, CURED PRODUCT, MULTILAYER BODY, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING MULTILAYER BODY, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | 富士フイルム株式会社 | 2024-09-12 | — | — | WO | disclosed |
| WO-2024150700-A1 | RESIN COMPOSITION, CURED ARTICLE, MULTILAYER BODY, METHOD FOR PRODUCING CURED ARTICLE, METHOD FOR PRODUCING MULTILAYER BODY, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN | 富士フイルム株式会社 | 2024-07-18 | — | — | WO | disclosed |
| WO-2024143209-A1 | METHOD FOR PRODUCING MULTILAYER BODY, PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR MEMBER | 富士フイルム株式会社 | 2024-07-04 | — | — | WO | disclosed |
| WO-2024143211-A1 | MEMBER, METHOD FOR MANUFACTURING MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR MEMBER | 富士フイルム株式会社 | 2024-07-04 | — | — | WO | disclosed |
| WO-2024143210-A1 | MEMBER, METHOD FOR MANUFACTURING MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR MEMBER | 富士フイルム株式会社 | 2024-07-04 | — | — | WO | disclosed |
| WO-2024143212-A1 | METHOD FOR MANUFACTURING LAMINATE, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR MEMBER, AND RESIN COMPOSITION | 富士フイルム株式会社 | 2024-07-04 | — | — | WO | disclosed |
| WO-2024101266-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | 富士フイルム株式会社 | 2024-05-16 | — | — | WO | disclosed |
| US-5173389-A | Polyhydroxy material reacted with 1,2-naphthoquinonediazide-4 or 5-sulfonyl chloride; novolak binder | FUJI PHOTO FILM CO., LTD. (JP) | 1992-12-22 | — | — | US | disclosed |
| WO-1992018457-A1 | PROCESS FOR TANNING HIDES AND COMPOUNDS FOR USE THEREIN | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 1992-10-29 | — | — | WO | disclosed |
| US-5143816-A | Lithography printing plates; good adhesion | FUJI PHOTO FILM CO., LTD. (JP) | 1992-09-01 | — | — | US | disclosed |
| EP-0496640-A1 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-29 | — | — | EP | disclosed |
| EP-0445819-A2 | Positive type photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1991-09-11 | — | — | EP | disclosed |
| EP-0410760-A2 | Light-sensitive compositions | FUJI PHOTO FILM CO., LTD. (JP) | 1991-01-30 | — | — | EP | disclosed |
| EP-0395049-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1990-10-31 | — | — | EP | disclosed |
| EP-0148787-A2 | Positive type photosensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-07-17 | — | — | EP | disclosed |
| US-4082691-A | FOR AQUEOUS SYSTEMS | WITCO CHEMICAL CORPORATION (US) | 1978-04-04 | — | — | US | disclosed |