Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Gallic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.74 |
| ▸ | MAPT | P10636 | 3/20 | 0.74 |
| ▸ | LMNA | P02545 | 3/20 | 0.74 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.74 |
| ▸ | CA12 | O43570 | 3/20 | 0.74 |
| ▸ | CA1 | P00915 | 3/20 | 0.74 |
| ▸ | CA2 | P00918 | 3/20 | 0.74 |
| ▸ | CA7 | P43166 | 3/20 | 0.74 |
| ▸ | CA9 | Q16790 | 3/20 | 0.74 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.74 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.74 |
| ▸ | CA4 | P22748 | 2/20 | 0.74 |
| ▸ | CA6 | P23280 | 2/20 | 0.74 |
| ▸ | FUT7 | Q11130 | 2/20 | 0.74 |
| ▸ | TP53 | P04637 | 1/20 | 0.74 |
| ▸ | CA3 | P07451 | 1/20 | 0.74 |
| ▸ | SELL | P14151 | 1/20 | 0.74 |
| ▸ | HPGD | P15428 | 1/20 | 0.74 |
| ▸ | SELP | P16109 | 1/20 | 0.74 |
| ▸ | FUT4 | P22083 | 1/20 | 0.74 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Gallic Acid SCHEMBL3515851 | 0.91 | KDM4E (0.81) | KDM4EMAPTLMNATDP1CA12 | |
| Gallic Acid SCHEMBL5427564 | 0.91 | KDM4E (0.81) | KDM4EMAPTLMNATDP1CA12 | |
| Gallic Acid SCHEMBL4599569 | 0.91 | KDM4E (0.81) | KDM4EMAPTLMNATDP1CA12 | |
| Gallic Acid SCHEMBL4126178 | 0.87 | KDM4E (0.74) | KDM4EMAPTLMNATDP1CA12 | |
| Gallic Acid SCHEMBL5874533 | 0.87 | KDM4E (0.74) | KDM4EMAPTLMNATDP1CA12 | |
| Gallic Acid SCHEMBL7775754 | 0.87 | KDM4E (0.74) | KDM4EMAPTLMNATDP1CA12 | |
| Gallic Acid SCHEMBL1325555 | 0.86 | KDM4E (0.90) | KDM4EMAPTLMNATDP1CA12 | |
| Gallic Acid SCHEMBL1845406 | 0.86 | CA12 (1.00) | KDM4EMAPTLMNATDP1CA12 | |
| Gallic Acid SCHEMBL4918056 | 0.86 | CA12 (1.00) | KDM4EMAPTLMNATDP1CA12 | |
| Gallic Acid SCHEMBL678990 | 0.86 | CA12 (1.00) | KDM4EMAPTLMNATDP1CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9475695-B2 | Printable inks with silicon/germanium based nanoparticles with high viscosity alcohol solvents | NANOGRAM CORPORATION (US) | 2016-10-25 | — | — | US | disclosed |
| US-20140346436-A1 | PRINTABLE INKS WITH SILICON/GERMANIUM BASED NANOPARTICLES WITH HIGH VISCOSITY ALCOHOL SOLVENTS | NANOGRAM CORPORATION (US) | 2014-11-27 | — | — | US | disclosed |
| EP-2804912-A1 | SILICON/GERMANIUM NANOPARTICLE INKS AND METHODS OF FORMING INKS WITH DESIRED PRINTING PROPERTIES | Nanogram Corporation (US) | 2014-11-26 | — | — | EP | disclosed |
| US-20140179049-A1 | SILICON/GERMANIUM-BASED NANOPARTICLE PASTES WITH ULTRA LOW METAL CONTAMINATION | NANOGRAM CORPORATION | 2014-06-26 | — | — | US | disclosed |
| WO-2014099978-A1 | SILICON/GERMANIUM-BASED NANOPARTICLE PASTES WITH ULTRA LOW METAL CONTAMINATION | NANOGRAM CORPORATION (US) | 2014-06-26 | — | — | WO | disclosed |
| US-20130189831-A1 | SILICON/GERMANIUM NANOPARTICLE INKS AND METHODS OF FORMING INKS WITH DESIRED PRINTING PROPERTIES | NANOGRAM CORPORATION | 2013-07-25 | — | — | US | disclosed |
| WO-2013109399-A1 | SILICON/GERMANIUM NANOPARTICLE INKS AND METHODS OF FORMING INKS WITH DESIRED PRINTING PROPERTIES | NANOGRAM CORPORATION (US) | 2013-07-25 | — | — | WO | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |