⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13177226 | 1.00 | — | — | |
| SCHEMBL22078937 | 1.00 | — | — | |
| SCHEMBL20311988 | 0.84 | LMNA (0.31) | — | |
| SCHEMBL19559278 | 0.79 | — | — | |
| SCHEMBL8285791 | 0.79 | — | — | |
| SCHEMBL13958621 | 0.73 | — | — | |
| SCHEMBL21737130 | 0.73 | — | — | |
| SCHEMBL13950600 | 0.73 | — | — | |
| SCHEMBL21737150 | 0.73 | — | — | |
| SCHEMBL18854226 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1920081-A2 | ATOMIC LAYER DEPOSITION OF METAL-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS | E.I.Du pont de nemours and company (US) | 2008-05-14 | — | — | EP | claimed |
| EP-1913174-A1 | ATOMIC LAYER DEPOSITION OF RUTHENIUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND SELECTED RUTHENIUM COMPLEXES | E.I.Du pont de nemours and company (US) | 2008-04-23 | — | — | EP | claimed |
| EP-1913173-A2 | ATOMIC LAYER DEPOSITION OF TANTALUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND NOVEL TANTALUM COMPLEXES | E.I.Du pont de nemours and company (US) | 2008-04-23 | — | — | EP | claimed |
| WO-2007019437-A1 | ATOMIC LAYER DEPOSITION OF RUTHENIUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND SELECTED RUTHENIUM COMPLEXES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-15 | — | — | WO | claimed |
| WO-2007019435-A2 | ATOMIC LAYER DEPOSITION OF METAL-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-15 | — | — | WO | claimed |
| WO-2007019436-A2 | ATOMIC LAYER DEPOSITION OF TANTALUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND NOVEL TANTALUM COMPLEXES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-15 | — | — | WO | claimed |
| US-8362167-B2 | Fluorinated imidoylamidine vulcanizing agents for curing perfluoroelastomers polymers | LODESTAR INC. (US) | 2013-01-29 | — | — | US | disclosed |
| EP-1920081-A2 | ATOMIC LAYER DEPOSITION OF METAL-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS | E.I.Du pont de nemours and company (US) | 2008-05-14 | — | — | EP | disclosed |
| EP-1913174-A1 | ATOMIC LAYER DEPOSITION OF RUTHENIUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND SELECTED RUTHENIUM COMPLEXES | E.I.Du pont de nemours and company (US) | 2008-04-23 | — | — | EP | disclosed |
| EP-1913173-A2 | ATOMIC LAYER DEPOSITION OF TANTALUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND NOVEL TANTALUM COMPLEXES | E.I.Du pont de nemours and company (US) | 2008-04-23 | — | — | EP | disclosed |
| US-20080035883-A1 | Fluorinated imidoylamidines vulcanizing agents | LODESTAR, INC. | 2008-02-14 | — | — | US | disclosed |
| WO-2007019435-A2 | ATOMIC LAYER DEPOSITION OF METAL-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-15 | — | — | WO | disclosed |
| WO-2007019437-A1 | ATOMIC LAYER DEPOSITION OF RUTHENIUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND SELECTED RUTHENIUM COMPLEXES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-15 | — | — | WO | disclosed |
| WO-2007019436-A2 | ATOMIC LAYER DEPOSITION OF TANTALUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND NOVEL TANTALUM COMPLEXES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-15 | — | — | WO | disclosed |