⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6131316 | 0.79 | TSHR (0.48) | — | |
| SCHEMBL19426880 | 0.77 | ALDH1A1 (0.41) | — | |
| SCHEMBL22027688 | 0.76 | ALDH1A1 (0.44) | — | |
| SCHEMBL28121292 | 0.76 | TSHR (0.39) | — | |
| SCHEMBL10396981 | 0.76 | TSHR (0.55) | — | |
| SCHEMBL3181489 | 0.74 | — | — | |
| SCHEMBL27908307 | 0.74 | ALDH1A1 (0.60) | — | |
| SCHEMBL2522824 | 0.74 | ALDH1A1 (0.52) | — | |
| Propane SCHEMBL28401317 | 0.72 | ALDH1A1 (0.50) | — | |
| Propane SCHEMBL28822763 | 0.72 | ALDH1A1 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112646185-A | Modified polythiol with high refractive index and preparation method thereof | 山东益丰生化环保股份有限公司 | 2021-04-13 | — | — | CN | disclosed |
| CN-106459303-A | Curable composition and photochromic composition | 株式会社德山 | 2017-02-22 | — | — | CN | disclosed |
| CN-105623230-A | Polycarbonate resin composition with improved compatibility having good scratch resistance and transparency and product thereof | LOTTE CHEMICAL CORP | 2016-06-01 | — | — | CN | disclosed |
| CN-101889036-B | Photochromic curable composition | TOKUYAMA CORPROATION | 2013-01-02 | — | — | CN | disclosed |
| CN-101889036-A | Photochromic curable composition | TOKUYAMA CORP | 2010-11-17 | — | — | CN | disclosed |
| US-7462653-B2 | Photocurable and thermosetting composition for ink jet system and printed circuit boards made by use thereof | TAIYO INK MANUFACTURING CO., LTD. (JP) | 2008-12-09 | — | — | US | disclosed |
| EP-1624001-B1 | PHOTOCURING/THERMOSETTING INKJET COMPOSITION AND PRINTED WIRING BOARD USING SAME | TAIYO INK MFG CO LTD (JP) | 2008-04-16 | — | — | EP | disclosed |
| US-20060058412-A1 | Monomer having a (meth)acryloyl group and thermosetting functional group; a photoreactive diluent having a weight-average molecular weight of not more than 700; photopolymerization initiator; viscosity of not more than 150 mPa*s at 25 degrees C.; solder resist pattern directly drawn on printed circuit | TAIYO INK MFG. CO., LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| EP-1624001-A1 | PHOTOCURING/THERMOSETTING INKJET COMPOSITION AND PRINTED WIRING BOARD USING SAME | Taiyo Ink Manufacturing Co. Ltd (JP) | 2006-02-08 | — | — | EP | disclosed |
| CN-1669816-A | Ink-jet recording material | AGFA GEVAERT (BE) | 2005-09-21 | — | — | CN | disclosed |
| CN-1165384-C | Process for prodn. of strongly adherent surface-coatings by plasma-activated grafting | �������⻯ѧƷ�ع�����˾ | 2004-09-08 | — | — | CN | disclosed |
| CN-1398205-A | Method for producing strongly adherent surface coatings by plasma activated grafting | CIBA SC HOLDING AG (CH) | 2003-02-19 | — | — | CN | disclosed |
| CN-1174854-A | Electrolyte and electrolytic cell | ROHM & HAAS (US) | 1998-03-04 | — | — | CN | disclosed |
| CN-1092782-A | Graft copolymer and with polyolefinic blend | ROHM & HAAS (US) | 1994-09-28 | — | — | CN | disclosed |
| CN-1041765-A | Graft copolymers and blends thereof with polyolefins | ROHM & HAAS (US) | 1990-05-02 | — | — | CN | disclosed |