SCHEMBL460176

SCHEMBL460176

O=S(=O)(O)C1C=CC=C(c2ccccc2)C1(O)S(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7536396 0.72
SCHEMBL7508819 0.68 CA1 (0.34)
SCHEMBL4758887 0.66 CA12 (0.35)
SCHEMBL27534590 0.66 CA12 (0.31)
SCHEMBL28007432 0.65
SCHEMBL4758848 0.64 CA1 (0.31)
SCHEMBL9667191 0.64 TSHR (0.31)
SCHEMBL27976531 0.64 THRB (0.34)
SCHEMBL28667586 0.62 THRB (0.33)
SCHEMBL30124886 0.62 PTPN1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060193789-A1 Surfacant, film forming agent, water, gas propellant; plant and animal extracts and oils; may include malathion FOAMIX LTD. (IL) 2006-08-31 US claimed
CN-117897058-A Collagen compositions and methods of use thereof 现代牧场股份有限公司 2024-04-16 CN disclosed
US-20240099948-A1 Compositions Comprising Silicon Dioxide-Based Particles Including One or More Agents COLABS INT'L CORP. (US) 2024-03-28 US disclosed
US-11839674-B2 Compositions comprising silicon dioxide-based particles including one or more agents CoLabs International Corporation (US) 2023-12-12 US disclosed
CN-116847871-A Skin care compositions and methods of use 现代牧场股份有限公司 2023-10-03 CN disclosed
US-11752086-B2 Topical formulations and methods MYOCEPT INC. (US) 2023-09-12 US disclosed
US-11724134-B2 Compositions containing a cellulose derived capsule with a sunscreen active agent CoLabs International Corporation (US) 2023-08-15 US disclosed
EP-3813786-A1 COMPOSITIONS COMPRISING SILICON DIOXIDE-BASED PARTICLES INCLUDING ONE OR MORE AGENTS Colabs International Corporation (US) 2021-05-05 EP disclosed
US-10889753-B2 Self-breakable treatment fluids for use in subterranean formation operations HALLIBURTON ENERGY SERVICES, INC. (US) 2021-01-12 US disclosed
US-20190290940-A1 Compositions Containing a Cellulose Derived Capsule with a Sunscreen Active Agent CoLabs International Corporation (US) 2019-09-26 US disclosed
US-20060093636-A1 Comprises allantoin and at least one anionic or nonionic emulsifier that is substantially hydrophilic and is soluble in water; composition is in the form of an oil-in-water emulsion; pH of the composition is about 3.0 to 6.0; preferred acidic anionic polymer is a carboxypolymethylene polymer; stability ALWYN COMPANY, INC. (US) 2006-05-04 US disclosed
US-20060067959-A1 Compositions and methods for treatment of solar damage NIMNI MARCEL 2006-03-30 US disclosed
US-20060045926-A1 Methods and compositions for enhancing collagen and proteoglycan synthesis in the skin NIMNI MARCEL 2006-03-02 US disclosed
WO-2003070161-A2 EMULSIFIED SKIN CARE COMPOSITION CONTAINING SALICYLIC ACID, LANOLIN OIL, AND PROPYLENE GLYCOL ALWYN COMPANY, INC. (US) 2003-08-28 WO disclosed
US-20030157137-A1 Emulsified skin care composition containing salicylic acid, lanolin oil, and propylene glycol ALWYN COMPANY, INC. 2003-08-21 US disclosed
US-20030147968-A1 Allantoin-containing preparations for administration as gels and aerosols ALWYN COMPANY, INC. 2003-08-07 US disclosed
WO-2003053369-A1 ALLANTOIN-CONTAINING PREPARATIONS FOR ADMINISTRATION AS GELS AND AEROSOLS ALWYN COMPANY, INC. (US) 2003-07-03 WO disclosed
US-20020054895-A1 And at least one anionic or nonionic emulsifier that is substantially hydrophilic and is soluble in water; skin protectants ALWYN COMPANY, INC. 2002-05-09 US disclosed
US-6376557-B1 TRANSDERMAL SUPPLYING ZAVERI CHANDA BHUWALKA (US) 2002-04-23 US disclosed
WO-2001068107-A1 HAIR RESTORATION FORMULATION ZAVERI CHANDA BHUWALKA (US) 2001-09-20 WO disclosed