Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.33 |
| ▸ | LCK | P06239 | 1/20 | 0.33 |
| ▸ | FYN | P06241 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL4181371 | 1.00 | ALDH1A1 (0.46) | ALDH1A1TDP1HSD17B10FFAR3LCK | |
| Methacrylic Acid SCHEMBL4172602 | 1.00 | ALDH1A1 (0.46) | ALDH1A1TDP1HSD17B10FFAR3LCK | |
| Methacrylic Acid SCHEMBL4175431 | 1.00 | ALDH1A1 (0.46) | ALDH1A1TDP1HSD17B10FFAR3LCK | |
| Cycloheptane SCHEMBL4179023 | 1.00 | ALDH1A1 (0.46) | ALDH1A1TDP1HSD17B10FFAR3LCK | |
| Methacrylic Acid SCHEMBL4174245 | 1.00 | ALDH1A1 (0.46) | ALDH1A1TDP1HSD17B10FFAR3LCK | |
| Methacrylic Acid SCHEMBL4188240 | 1.00 | ALDH1A1 (0.46) | ALDH1A1TDP1HSD17B10FFAR3LCK | |
| Cyclohexane SCHEMBL4165841 | 1.00 | ALDH1A1 (0.46) | ALDH1A1TDP1HSD17B10FFAR3LCK | |
| Methacrylic Acid SCHEMBL4188824 | 1.00 | ALDH1A1 (0.46) | ALDH1A1TDP1HSD17B10FFAR3LCK | |
| Methacrylic Acid SCHEMBL23699842 | 0.91 | ALDH1A1 (0.53) | ALDH1A1TDP1HSD17B10FFAR3LCK | |
| Methacrylic Acid SCHEMBL285672 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117941905-A | Antifouling moisture-permeable waterproof vamp and preparation method thereof | 泉州盛步新材料科技有限公司 | 2024-04-30 | — | — | CN | claimed |
| CN-117903379-A | High-wear-resistance resin for marble and preparation method thereof | 顾家家居股份有限公司 | 2024-04-19 | — | — | CN | claimed |
| US-10195133-B2 | Photocurable composition for nail or artificial nail | THREE BOND CO., LTD. | 2019-02-05 | — | — | US | claimed |
| US-20180215850-A1 | PHOTOCURABLE RESIN COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME | CHEM OPTICS INC. (KR) | 2018-08-02 | — | — | US | claimed |
| US-8163835-B2 | Anisotropic conductive adhesive composition, anisotropic conductive film comprising the same, and associated methods | CHEIL INDUSTRIES, INC. (KR) | 2012-04-24 | — | — | US | claimed |
| US-20090078747-A1 | Anisotropic conductive adhesive composition, anisotropic conductive film comprising the same, and associated methods | KUKDO ADVANCED MATERIALS CO., LTD. (KR) | 2009-03-26 | — | — | US | claimed |
| US-6117609-A | MICROCAPSULES COMPRISE A PHOTOPOLYMERIZABLE UNSATURATED COMPOUND AND A PHOSPHITE HAVING AT LEAST ONE THIO LINKAGE; COLORANT AS A PHOTOSENSITIZER; HARDENING USING LOW ENERGY; ANTISOILANTS | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2000-09-12 | — | — | US | claimed |
| US-6025112-A | COMPOSITION HIGHLY SENSITIVE TO NEAR INFRARED RADIATION AND VISIBLE LIGHT HAVING SPECIFIED WAVELENGTH, COMPRISING UNSATURATED COMPOUND BASE MATERIAL, METAL ARENE PHOTOPOLYMERIZATION INITIATOR, ANILINE COMPOUND | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2000-02-15 | — | — | US | claimed |
| EP-0884650-A1 | Photosensitive recording material using microcapsules | Brother Kogyo Kabushiki Kaisha (JP) | 1998-12-16 | — | — | EP | claimed |
| CN-108601710-B | Dental composition comprising nanoparticles providing a refractive index difference between a polymerizable resin and a filler | 舒万诺知识产权公司 | 2024-06-04 | — | — | CN | disclosed |
| WO-2024106445-A1 | COMPOSITION FOR REPAIRING LIQUID LEAKAGE AND METHOD FOR REPAIRING LIQUID LEAKAGE | デクセリアルズ株式会社 | 2024-05-23 | — | — | WO | disclosed |
| CN-117941905-A | Antifouling moisture-permeable waterproof vamp and preparation method thereof | 泉州盛步新材料科技有限公司 | 2024-04-30 | — | — | CN | disclosed |
| CN-117903379-A | High-wear-resistance resin for marble and preparation method thereof | 顾家家居股份有限公司 | 2024-04-19 | — | — | CN | disclosed |
| US-20240111077-A1 | OPTICAL ELEMENT, OPTICAL APPARATUS, AND IMAGE PICKUP APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2024-04-04 | — | — | US | disclosed |
| US-20030096139-A1 | Magnetic recording medium | FUJI PHOTO FILM CO., LTD. | 2003-05-22 | — | — | US | disclosed |
| US-6242149-B1 | LIGHT SENSITIVE ELEMENTS CURED WITH RADIATION, RADICAL POLYMERIZATION, PHOTOPOLYMERIZATION, ENCAPSULATION | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2001-06-05 | — | — | US | disclosed |
| US-6117609-A | MICROCAPSULES COMPRISE A PHOTOPOLYMERIZABLE UNSATURATED COMPOUND AND A PHOSPHITE HAVING AT LEAST ONE THIO LINKAGE; COLORANT AS A PHOTOSENSITIZER; HARDENING USING LOW ENERGY; ANTISOILANTS | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2000-09-12 | — | — | US | disclosed |
| US-6025112-A | COMPOSITION HIGHLY SENSITIVE TO NEAR INFRARED RADIATION AND VISIBLE LIGHT HAVING SPECIFIED WAVELENGTH, COMPRISING UNSATURATED COMPOUND BASE MATERIAL, METAL ARENE PHOTOPOLYMERIZATION INITIATOR, ANILINE COMPOUND | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2000-02-15 | — | — | US | disclosed |
| EP-0924569-A1 | Fast-curing photosensitive composition and recording sheet | Brother Kogyo Kabushiki Kaisha (JP) | 1999-06-23 | — | — | EP | disclosed |
| EP-0884650-A1 | Photosensitive recording material using microcapsules | Brother Kogyo Kabushiki Kaisha (JP) | 1998-12-16 | — | — | EP | disclosed |