SCHEMBL461329

SCHEMBL461329

CCCCC[SiH2]O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5335209 0.97 TSHR (0.42)
SCHEMBL598639 0.97 TSHR (0.42)
SCHEMBL9237632 0.97 TSHR (0.42)
SCHEMBL7870036 0.97 TSHR (0.42)
SCHEMBL176365 0.97 TSHR (0.42)
SCHEMBL9847969 0.97 TSHR (0.42)
SCHEMBL18425249 0.97 TSHR (0.42)
SCHEMBL596014 0.97 TSHR (0.42)
SCHEMBL18425709 0.97 TSHR (0.42)
SCHEMBL5695346 0.97 TSHR (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 714 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240213093-A1 CATALYST-ENHANCED CHEMICAL VAPOR DEPOSITION TOKYO ELECTRON LIMITED (JP) 2024-06-27 US claimed
WO-2024137050-A1 CATALYST-ENHANCED CHEMICAL VAPOR DEPOSITION TOKYO ELECTRON LIMITED (JP) 2024-06-27 WO claimed
CN-117327249-A Transparent silicone resin and application thereof 广东工业大学 2024-01-02 CN claimed
CN-117070030-A Brominated butyl rubber plug and preparation method and treatment method thereof 应城市恒天药业包装有限公司 2023-11-17 CN claimed
WO-2023164685-A1 SELECTIVE INHIBITION FOR SELECTIVE METAL DEPOSITION TOKYO ELECTRON LIMITED (JP) 2023-08-31 WO claimed
US-20230274932-A1 SELECTIVE INHIBITION FOR SELECTIVE METAL DEPOSITION TOKYO ELECTRON LIMITED (JP) 2023-08-31 US claimed
CN-116288247-A Intelligent regulation double-control system for inhibiting D4 polymerization to generate gel 武汉烽火锐拓科技有限公司 2023-06-23 CN claimed
CN-111354945-B Negative electrode for secondary lithium metal battery and method for manufacturing same 通用汽车环球科技运作有限责任公司 2023-05-23 CN claimed
US-11621190-B2 Method for filling recessed features in semiconductor devices with a low-resistivity metal TOKYO ELECTRON LIMITED (JP) 2023-04-04 US claimed
CN-113336677-B Synthesis method of aryl siloxane amination reaction 湖北工业大学 2023-03-24 CN claimed
EP-0267469-B1 SILICONE AND PHOSPHATE ESTER SLIPPING LAYER FOR DYE-DONOR ELEMENT USED IN THERMAL DYE TRANSFER EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1990-08-29 EP claimed
EP-0206446-B1 PRODUCING FUSED POLYMERIC ARTICLES British United Shoe Machinery Limited (GB) 1989-12-13 EP claimed
EP-0272400-A1 Polyester subbing layer for slipping layer of dye-donor element used in thermal dye transfer EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1988-06-29 EP claimed
EP-0267469-A1 Silicone and phosphate ester slipping layer for dye-donor element used in thermal dye transfer EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1988-05-18 EP claimed
US-4740496-A Release agent for thermal dye transfer EASTMAN KODAK COMPANY (US) 1988-04-26 US claimed
US-4737485-A Silicone and phosphate ester slipping layer for dye-donor element used in thermal dye transfer EASTMAN KODAK COMPANY (US) 1988-04-12 US claimed
US-4727057-A Polyester subbing layer for slipping layer of dye-donor element used in thermal dye transfer EASTMAN KODAK COMPANY (US) 1988-02-23 US claimed
EP-0227092-A2 Release agent for thermal dye transfer EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-07-01 EP claimed
EP-0206446-A1 Producing fused polymeric articles British United Shoe Machinery Limited (GB) 1986-12-30 EP claimed
US-4623589-A OLEFIN POLYMERS, IONOMERS, RELEASE AGENTS USM CORPORATION (US) 1986-11-18 US claimed