SCHEMBL461557

SCHEMBL461557

CC(O)CC(O)C(F)(F)F

nearest known ligand 0.46

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CETP P11597 1/20 0.46
PKM P14618 1/20 0.37
TSHR P16473 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
ALDH1A1 P00352 1/20 0.33
LMNA P02545 1/20 0.31
HTT P42858 1/20 0.31
KMT2A Q03164 1/20 0.31
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12868845 0.82 CETP (0.46) CETPPKMTSHRALDH1A1LMNA
SCHEMBL7530106 0.82 CETP (0.46) CETPPKMTSHRALDH1A1LMNA
SCHEMBL1492602 0.82 CETP (0.46) CETPPKMTSHRALDH1A1LMNA
SCHEMBL459896 0.81 CETP (0.56) CETPPKMLMNAHTTKMT2A
Hydrochloric Acid SCHEMBL7425924 0.80 CETP (0.43) CETPPKMTSHRALDH1A1LMNA
SCHEMBL25543809 0.78 CETP (0.42) CETPPKM
SCHEMBL7171615 0.78 CETP (0.42) CETPPKMTSHR
Calcium SCHEMBL9561192 0.78 CETP (0.53) CETPPKMLMNAHTTKMT2A
SCHEMBL7181118 0.78 CETP (0.53) CETPPKMLMNAHTTKMT2A
SCHEMBL27683427 0.78 CETP (0.53) CETPPKMLMNAHTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3033378-B1 A PROCESS TO PRODUCE POLYCARBAMATE, POLYCARBAMATE PRODUCED THEREBY AND A COATING COMPOSITION COMPRISING THE POLYCARBAMATE DOW GLOBAL TECHNOLOGIES LLC (US) 2020-02-12 EP claimed
US-20160222164-A1 Process to Produce Polycarbamate, Polycarbamate Produced Thereby and a Coating Composition Comprising the Polycarbamate DOW GLOBAL TECHNOLOGIES LLC 2016-08-04 US claimed
US-20160200871-A1 A Process to Produce Polycarbamate, Polycarbamate Produced Thereby and a Coating Composition Comprising the Polycarbamate DOW GLOBAL TECHNOLOGIES LLC (US) 2016-07-14 US claimed
US-20160185713-A1 A Process to Produce Polycarbamate, Polycarbamate Produced Thereby and a Coating Composition Comprising the Polycarbamate DOW GLOBAL TECHNOLOGIES LLC (US) 2016-06-30 US claimed
EP-3033377-A1 A PROCESS TO PRODUCE POLYCARBAMATE, POLYCARBAMATE PRODUCED THEREBY AND A COATING COMPOSITION COMPRISING THE POLYCARBAMATE Dow Global Technologies LLC (US) 2016-06-22 EP claimed
EP-3033376-A1 A PROCESS TO PRODUCE POLYCARBAMATE, POLYCARBAMATE PRODUCED THEREBY AND A COATING COMPOSITION COMPRISING THE POLYCARBAMATE Dow Global Technologies LLC (US) 2016-06-22 EP claimed
EP-3033378-A1 A PROCESS TO PRODUCE POLYCARBAMATE, POLYCARBAMATE PRODUCED THEREBY AND A COATING COMPOSITION COMPRISING THE POLYCARBAMATE Dow Global Technologies LLC (US) 2016-06-22 EP claimed
WO-2015023907-A1 A PROCESS TO PRODUCE PLYCARBAMATE, POLYCARBAMATE PRODUCED THEREBY AND A COATING COMPOSITION COMPRISING THE POLYCARBAMATE DOW GLOBAL TECHNOLOGIES LLC (US) 2015-02-19 WO claimed
WO-2015023906-A1 A PROCESS TO PRODUCE POLYCARBAMATE, POLYCARBAMATE PRODUCED THEREBY AND A COATING COMPOSITION COMPRISING THE POLYCARBAMATE DOW GLOBAL TECHNOLOGIES LLC (US) 2015-02-19 WO claimed
WO-2015023905-A1 A PROCESS TO PRODUCE POLYCARBAMATE, POLYCARBAMATE PRODUCED THEREBY AND A COATING COMPOSITION COMPRISING THE POLYCARBAMATE DOW GLOBAL TECHNOLOGIES LLC (US) 2015-02-19 WO claimed
US-5919522-A VAPOR DEPOSITION ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1999-07-06 US claimed
US-5840897-A Metal complex source reagents for chemical vapor deposition ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1998-11-24 US claimed
EP-0873343-A1 METAL COMPLEX SOURCE REAGENTS FOR CHEMICAL VAPOR DEPOSITION ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1998-10-28 EP claimed
WO-1998045499-A1 GROWTH OF BaSrTiO3 USING POLYAMINE-BASED PRECURSORS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1998-10-15 WO claimed
WO-1996040690-A1 METAL COMPLEX SOURCE REAGENTS FOR CHEMICAL VAPOR DEPOSITION ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1996-12-19 WO claimed
EP-0746563-A1 METHOD FOR THE DEPOSITION OF NICKEL AND/OR NICKEL OXIDE FROM THE GAS PHASE, AND NOVEL NICKEL COMPOUNDS HAVING STABLE VAPORISATION CHARACTERISTICS NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO (NL) 1996-12-11 EP claimed
WO-1995023155-A1 METHOD FOR THE DEPOSITION OF NICKEL AND/OR NICKEL OXIDE FROM THE GAS PHASE, AND NOVEL NICKEL COMPOUNDS HAVING STABLE VAPORISATION CHARACTERISTICS NEDERLANDSE ORGANISATIE VOOR TOEGEPASTNATUURWETENSCHAPPELIJK ONDERZOEK TNO (NL) 1995-08-31 WO claimed
EP-0454843-A4 METHOD AND APPARATUS FOR THE RAPID DEPOSITION BY CHEMICAL VAPOR DEPOSITION WITH LOW VAPOR PRESSURE REACTANTS GEORGIA TECH RES INST (US) 1994-12-28 EP claimed
EP-0454843-A1 METHOD AND APPARATUS FOR THE RAPID DEPOSITION BY CHEMICAL VAPOR DEPOSITION WITH LOW VAPOR PRESSURE REACTANTS GEORGIA TECH RESEARCH CORPORATION (US) 1991-11-06 EP claimed
WO-1991007236-A1 METHOD AND APPARATUS FOR THE RAPID DEPOSITION BY CHEMICAL VAPOR DEPOSITION WITH LOW VAPOR PRESSURE REACTANTS GEORGIA TECH RESEARCH CORPORATION (US) 1991-05-30 WO claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160185713-A1 A Process to Produce Polycarbamate, Polycarbamate Produced Thereby and a Coating Composition Comprising the Polycarbamate F9, SOD1, ZYX CETP 2603/4885PKM 277/4885TSHR 4314/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.