⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4999945 | 0.79 | — | — | |
| SCHEMBL29028453 | 0.78 | — | — | |
| SCHEMBL29028659 | 0.77 | — | — | |
| SCHEMBL28236988 | 0.76 | — | — | |
| SCHEMBL3836526 | 0.71 | — | — | |
| SCHEMBL9909128 | 0.71 | — | — | |
| SCHEMBL5005301 | 0.70 | — | — | |
| SCHEMBL17633797 | 0.67 | — | — | |
| SCHEMBL3668837 | 0.66 | — | — | |
| SCHEMBL4993659 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1687373-B1 | POLYPROPYLENE PIPE | INEOS MFG BELGIUM NV (BE) | 2008-03-12 | — | — | EP | disclosed |
| US-20070032675-A1 | Forming a dielectric layer using a hydrocarbon-containing precursor | MEAGLEY ROBERT P | 2007-02-08 | — | — | US | disclosed |
| US-7169715-B2 | Forming a dielectric layer using porogens | INTEL CORPORATION (US) | 2007-01-30 | — | — | US | disclosed |
| US-7138158-B2 | Forming a dielectric layer using a hydrocarbon-containing precursor | INTEL CORPORATION (US) | 2006-11-21 | — | — | US | disclosed |
| EP-1687373-A1 | POLYPROPYLENE PIPE | Innovene Manufacturing Belgium NV (BE) | 2006-08-09 | — | — | EP | disclosed |
| WO-2005040271-A1 | POLYPROPYLENE PIPE | INNOVENE MANUFACTURING BELGIUM NV (BE) | 2005-05-06 | — | — | WO | disclosed |
| US-20040185679-A1 | Forming a dielectric layer using porogens | INTEL CORPORATION | 2004-09-23 | — | — | US | disclosed |
| US-20040170760-A1 | Forming a dielectric layer using a hydrocarbon-containing precursor | INTEL CORPORATION | 2004-09-02 | — | — | US | disclosed |