⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL620975 | 0.79 | TSHR (0.39) | — | |
| SCHEMBL27403877 | 0.77 | TSHR (0.30) | — | |
| SCHEMBL1341716 | 0.75 | — | — | |
| SCHEMBL3030245 | 0.73 | — | — | |
| SCHEMBL27571124 | 0.73 | TSHR (0.32) | — | |
| SCHEMBL10474452 | 0.73 | — | — | |
| SCHEMBL28202413 | 0.71 | — | — | |
| SCHEMBL56624 | 0.71 | — | — | |
| SCHEMBL306915 | 0.71 | — | — | |
| SCHEMBL7872880 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108292097-A | Pattern forming method, the manufacturing method of electronic device, stacked film and upper layer film formation composition | 富士胶片株式会社 | 2018-07-17 | — | — | CN | disclosed |
| EP-1756271-B1 | METHODS FOR OBTAINING OPTICALLY ACTIVE EPOXIDES AND VICINAL DIOLS FROM 2,2-DISUBSTITUTED EPOXIDES | CSIR (ZA) | 2015-12-09 | — | — | EP | disclosed |
| EP-1753862-B1 | METHODS FOR OBTAINING OPTICALLY ACTIVE EPOXIDES AND VICINAL DIOLS FROM MESO-EPOXIDES | CSIR (ZA) | 2015-11-18 | — | — | EP | disclosed |
| WO-2014142360-A1 | METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-09-18 | — | — | WO | disclosed |
| WO-2014104400-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-07-03 | — | — | WO | disclosed |
| WO-2014017618-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2014-01-30 | — | — | WO | disclosed |
| WO-2014007361-A1 | METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2014-01-09 | — | — | WO | disclosed |
| WO-2014003206-A1 | METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2014-01-03 | — | — | WO | disclosed |
| WO-2013187530-A1 | PATTERN FORMING METHOD, COMPOSITION USED THEREIN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-12-19 | — | — | WO | disclosed |
| WO-2013187520-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM USED THEREFOR, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-12-19 | — | — | WO | disclosed |
| US-20070275448-A1 | Methods For Obtaining Optically Active Epoxides And Vicinal Diols From Meso-Epoxides | CSIR (ZA) | 2007-11-29 | — | — | US | disclosed |
| WO-2007069079-A2 | METHODS FOR OBTAINING OPTICALLY ACTIVE EPOXIDES AND DIOLS FROM 2,3-DISUBSTITUTED AND 2,3-TRISUBSTITUTED EPOXIDES | CSIR (US) | 2007-06-21 | — | — | WO | disclosed |
| EP-1753862-A2 | METHODS FOR OBTAINING OPTICALLY ACTIVE EPOXIDES AND VICINAL DIOLS FROM MESO-EPOXIDES | CSIR (ZA) | 2007-02-21 | — | — | EP | disclosed |
| WO-2006109198-A2 | METHODS FOR OBTAINING OPTICALLY ACTIVE GLYCIDYL ETHERS AND OPTICALLY ACTIVE VICINAL DIOLS FROM RACEMIC SUBSTRATES | OXYRANE UK LIMITED (GB) | 2006-10-19 | — | — | WO | disclosed |
| WO-2005100578-A2 | METHODS FOR OBTAINING OPTICALLY ACTIVE EPOXIDES AND VICINAL DIOLS FROM MESO-EPOXIDES | CSIR (ZA) | 2005-10-27 | — | — | WO | disclosed |
| US-5635498-A | ADMINISTERING A 2-(DIALKYLAMINOALKYLENEOXY-),17 OR 16-KETO-ESTRA-1,3,5(10)-TRIENE; TREATING STERILITY; ANTIFERTILITY AGENTS | ROUSSEL UCLAF (FR) | 1997-06-03 | — | — | US | disclosed |
| US-4683224-A | INSECTICIDES, MITICIDES, NEMATOCIDES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-07-28 | — | — | US | disclosed |
| EP-0033928-B1 | USE OF ALKYL-SUBSTITUTED 1,3-DIOXOLANES AS PERFUMES, AND PERFUME COMPOSITIONS CONTAINING THEM | Henkel Kommanditgesellschaft auf Aktien (DE) | 1985-05-08 | — | — | EP | disclosed |
| US-4435315-A | COSMETICS, DETERGENTS | HENKEL KOMMANDITGESELLSCHAFT AUF ATKIEN (DE) | 1984-03-06 | — | — | US | disclosed |
| EP-0033928-A2 | Use of alkyl-substituted 1,3-dioxolanes as perfumes, and perfume compositions containing them | Henkel Kommanditgesellschaft auf Aktien (DE) | 1981-08-19 | — | — | EP | disclosed |