⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL3715512 | 0.96 | — | — | |
| SCHEMBL10518262 | 0.69 | — | — | |
| SCHEMBL3714074 | 0.69 | — | — | |
| SCHEMBL27922143 | 0.67 | TSHR (0.38) | — | |
| SCHEMBL22105 | 0.67 | — | — | |
| SCHEMBL277738 | 0.67 | — | — | |
| SCHEMBL15577103 | 0.67 | KDM1A (0.33) | — | |
| SCHEMBL15577105 | 0.67 | KDM1A (0.33) | — | |
| Methane SCHEMBL23927285 | 0.64 | — | — | |
| SCHEMBL252879 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2009 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12027365-B2 | Methods for filling a gap and related systems and devices | ASM IP HOLDING B.V. (NL) | 2024-07-02 | — | — | US | claimed |
| US-20240145303-A1 | SELECTIVE THIN FILM FORMATION METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-05-02 | — | — | US | claimed |
| US-11965238-B2 | Selective deposition of metal oxides on metal surfaces | ASM IP HOLDING B.V. (NL) | 2024-04-23 | — | — | US | claimed |
| CN-117820350-A | Alkyl aminosilane and preparation method thereof | 苏州巴特克电子技术服务有限公司 | 2024-04-05 | — | — | CN | claimed |
| WO-2024071976-A1 | SILICON PRECURSOR COMPOUND IN ASYMMETRIC STRUCTURE, METHOD FOR PREPARING THE SAME, AND METHOD FOR PREPARING A SILICON-CONTAINING THIN FILM | MERCK PATENT GMBH (DE) | 2024-04-04 | — | — | WO | claimed |
| CN-109559974-B | Method for manufacturing semiconductor device, substrate processing apparatus, and recording medium | 株式会社国际电气 | 2024-03-22 | — | — | CN | claimed |
| US-11898240-B2 | Selective deposition of silicon oxide on dielectric surfaces relative to metal surfaces | ASM IP HOLDING B.V. (NL) | 2024-02-13 | — | — | US | claimed |
| US-20240047197-A1 | SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION | ASM IP HOLDING B.V. (NL) | 2024-02-08 | — | — | US | claimed |
| US-20240008273-A1 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE | KIOXIA CORPORATION (JP) | 2024-01-04 | — | — | US | claimed |
| CN-112593212-B | Method for forming topologically selective silicon oxide film by cyclic plasma enhanced deposition process | ASM IP私人控股有限公司 | 2023-12-22 | — | — | CN | claimed |
| EP-0258384-A4 | LIGHTWEIGHT JOINT COMPOUND HAVING IMPROVED PAINTABILITY. | UNITED STATES GYPSUM CO (US) | 1988-06-27 | — | — | EP | claimed |
| EP-0258384-A1 | LIGHTWEIGHT JOINT COMPOUND HAVING IMPROVED PAINTABILITY. | UNITED STATES GYPSUM CO (US) | 1988-03-09 | — | — | EP | claimed |
| WO-1987005008-A1 | LIGHTWEIGHT JOINT COMPOUND HAVING IMPROVED PAINTABILITY | UNITED STATES GYPSUM COMPANY (US) | 1987-08-27 | — | — | WO | claimed |
| US-4686253-A | COATED PERLITE | UNITED STATES GYPSUM COMPANY (US) | 1987-08-11 | — | — | US | claimed |
| EP-0187297-A2 | Alkoxy methyl ether and alkoxy methyl ester derivatives | SYNTEX (U.S.A.) INC. (US) | 1986-07-16 | — | — | EP | claimed |
| US-4430496-A | Strong anion exchange composition and methods | VARIAN ASSOCIATES, INC. (US) | 1984-02-07 | — | — | US | claimed |
| US-4322542-A | Strong anion exchange composition | VARIAN ASSOCIATES, INC. (US) | 1982-03-30 | — | — | US | claimed |
| US-4124418-A | Siloxane-coated ammonium perchlorate and propellant compositions made therewith | THIOKOL CORPORATION (US) | 1978-11-07 | — | — | US | claimed |
| US-4064155-A | FROM A CHLOROALKYL-SILANEDI- OR TRIOL AND AN AMINE, VOLATILIZATION | DOW CORNING CORPORATION (US) | 1977-12-20 | — | — | US | claimed |
| US-4010233-A | DRY SPINNING, HEAT TREATING, METAL OXIDE PHASE AND DISPERSE PHASE | BAYER AKTIENGESELLSCHAFT (DT) | 1977-03-01 | — | — | US | claimed |