Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.64 |
| ▸ | LMNA | P02545 | 1/20 | 0.64 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.64 |
| ▸ | TSHR | P16473 | 4/20 | 0.41 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | MGAM | O43451 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | SI | P14410 | 1/20 | 0.37 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.37 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.37 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.35 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | CYP4F2 | P78329 | 2/20 | 0.33 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethyl Acetate SCHEMBL487488 | 0.94 | ALDH1A1 (0.56) | ALDH1A1LMNAHSD17B10TSHRGLO1 | |
| Ethyl Acetate SCHEMBL3626248 | 0.94 | ALDH1A1 (0.56) | ALDH1A1LMNAHSD17B10TSHRGLO1 | |
| Ethyl Acetate SCHEMBL20210846 | 0.94 | ALDH1A1 (0.56) | ALDH1A1LMNAHSD17B10TSHRGLO1 | |
| Ethyl Acetate SCHEMBL25203313 | 0.93 | — | — | |
| Ethyl Acetate SCHEMBL27618545 | 0.89 | ALDH1A1 (0.61) | ALDH1A1LMNAHSD17B10TSHRGLO1 | |
| Ethyl Acetate SCHEMBL8160057 | 0.89 | ALDH1A1 (0.52) | ALDH1A1LMNAHSD17B10TSHRGLO1 | |
| Ethyl Acetate SCHEMBL50341 | 0.88 | ALDH1A1 (0.82) | ALDH1A1LMNAHSD17B10TSHRGLO1 | |
| Ethyl Acetate SCHEMBL6391391 | 0.86 | ALDH1A1 (0.64) | ALDH1A1LMNAHSD17B10TSHRGLO1 | |
| Ethyl Acetate SCHEMBL2191775 | 0.86 | ALDH1A1 (0.64) | ALDH1A1LMNAHSD17B10TSHRGLO1 | |
| Ethyl Acetate SCHEMBL106222 | 0.86 | ALDH1A1 (0.52) | ALDH1A1LMNAHSD17B10TSHRGLO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130295807-A1 | SIZING ADDITIVES FOR DRYCLEANING PROCESSES | FABRITEC INTERNAT CORP (US) | 2013-11-07 | — | — | US | claimed |
| US-20120329349-A1 | SIZING ADDITIVES FOR DRYCLEANING PROCESSES | FABRITEC INTERNATIONAL CORPORATION (US) | 2012-12-27 | — | — | US | claimed |
| WO-2024063044-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-03-28 | — | — | WO | disclosed |
| WO-2024019064-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | 日産化学株式会社 | 2024-01-25 | — | — | WO | disclosed |
| WO-2024009993-A1 | METHOD OF MANUFACTURING LAMINATE AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT | 日産化学株式会社 | 2024-01-11 | — | — | WO | disclosed |
| WO-2024004323-A1 | CURABLE COMPOSITION | 日産化学株式会社 | 2024-01-04 | — | — | WO | disclosed |
| WO-2023243484-A1 | CURABLE COMPOSITION, METHOD FOR FORMING INVERTED PATTERN, METHOD FOR FORMING FILM, AND METHOD FOR PRODUCING ARTICLE | キヤノン株式会社 | 2023-12-21 | — | — | WO | disclosed |
| WO-2023204078-A1 | METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND SILICON-CONTAINING COMPOSITION | JSR株式会社 | 2023-10-26 | — | — | WO | disclosed |
| WO-2023190807-A1 | BRUSH MATERIAL FOR SELF-ASSEMBLED FILM | 日産化学株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2022054569-A1 | ARGAN EXTRACT MANUFACTURING METHOD, ARGAN EXTRACT, HAIR GROWTH PROMOTION AGENT, HAIR LOSS PREVENTION AGENT, AND HAIR CYCLE REGULATION AGENT | 株式会社ADEKA | 2022-03-17 | — | — | WO | disclosed |
| CN-113454131-A | Polymer, semiconductor composition containing polymer, and method for producing film using semiconductor composition | 默克专利有限公司 | 2021-09-28 | — | — | CN | disclosed |
| CN-111352301-A | Radiation-sensitive resin composition and method for forming microlens | JSR株式会社 | 2020-06-30 | — | — | CN | disclosed |
| US-8795543-B2 | Sizing additives for drycleaning processes | FABRITEC INTERNATIONAL CORPORATION (US) | 2014-08-05 | — | — | US | disclosed |
| US-20130295807-A1 | SIZING ADDITIVES FOR DRYCLEANING PROCESSES | FABRITEC INTERNAT CORP (US) | 2013-11-07 | — | — | US | disclosed |
| US-8507045-B2 | Sizing additives for drycleaning processes | FABRITEC INTERNATIONAL CORPORATION (US) | 2013-08-13 | — | — | US | disclosed |
| US-20120329349-A1 | SIZING ADDITIVES FOR DRYCLEANING PROCESSES | FABRITEC INTERNATIONAL CORPORATION (US) | 2012-12-27 | — | — | US | disclosed |
| EP-1535976-B1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR CORP (JP) | 2008-01-16 | — | — | EP | disclosed |
| EP-1535976-A1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR Corporation (JP) | 2005-06-01 | — | — | EP | disclosed |
| US-20050112386-A1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR CORPORATION (JP) | 2005-05-26 | — | — | US | disclosed |