⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL36804 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL8808124 | 0.93 | LMNA (0.30) | — | |
| Hydrochloric Acid SCHEMBL28375149 | 0.93 | — | — | |
| Ammonia Solution, Strong SCHEMBL28444448 | 0.93 | — | — | |
| Fluoride SCHEMBL31281281 | 0.93 | — | — | |
| Bromide SCHEMBL27580058 | 0.93 | — | — | |
| SCHEMBL4816215 | 0.91 | — | — | |
| SCHEMBL134350 | 0.91 | — | — | |
| SCHEMBL3099496 | 0.91 | — | — | |
| SCHEMBL10488869 | 0.91 | LMNA (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101622686-B | Paste for electron emission source and electron-emitting device | TORAY INDUSTRIES | 2013-04-24 | — | — | CN | disclosed |
| CN-101622686-A | Paste for electron emission source and electron-emitting device | TORAY INDUSTRIES | 2010-01-06 | — | — | CN | disclosed |
| CN-101184691-A | Electric double layer capacitor | SUMITOMO CHEMICAL CO (JP) | 2008-05-21 | — | — | CN | disclosed |
| CN-101180691-A | Electric double layer capacitor | SUMITOMO CHEMICAL CO (JP) | 2008-05-14 | — | — | CN | disclosed |
| CN-100384430-C | Combination therepy comprising glucose reabsorption inhibitors and retinoid-x receptor modulators | ORTHO MCNEIL PHARM INC (US) | 2008-04-30 | — | — | CN | disclosed |
| EP-1535976-B1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR CORP (JP) | 2008-01-16 | — | — | EP | disclosed |
| EP-1535976-A1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR Corporation (JP) | 2005-06-01 | — | — | EP | disclosed |
| US-20050112386-A1 | Composition for film formation, method for preparing the composition, and method for forming insulating film | JSR CORPORATION (JP) | 2005-05-26 | — | — | US | disclosed |
| CN-1511038-A | Combination therepy comprising glucose reabsorption inhibitors and retinoid-x receptor modulators | ����-������ҩƷ��˾ | 2004-07-07 | — | — | CN | disclosed |
| EP-0747425-B1 | RUBBER COMPOSITION AND PROCESS FOR PRODUCING THE SAME | NIPPON ZEON CO (JP) | 1999-07-14 | — | — | EP | disclosed |
| US-5880206-A | DIENE POLYMER RUBBER HAVING A PRIMARY AMINO GROUP MADE BY REACTING A DIENE POLYMER HAVING AN ACTIVE METAL BOUND TO THE MOLECULE WITH A N-SUBSTITUTED AZIRIDINE COMPOUND, AND SILICA; TENSILE STRENGTH, REBOUND RESILIENCE, ABRASION RESISTANCE | NIPPON ZEON CO., LTD. (JP) | 1999-03-09 | — | — | US | disclosed |
| EP-0747425-A1 | RUBBER COMPOSITION AND PROCESS FOR PRODUCING THE SAME | NIPPON ZEON CO., LTD. (JP) | 1996-12-11 | — | — | EP | disclosed |
| CN-1013377-B | WELL-DRILLING LIQUID | SHELL INT RESEARCH (NL) | 1991-07-31 | — | — | CN | disclosed |
| CN-85107367-A | Drilling fluid | — | 1987-04-15 | — | — | CN | disclosed |
| US-4073066-A | Methylene chloride phosphatizing | DIAMOND SHAMROCK CORPORATION (US) | 1978-02-14 | — | — | US | disclosed |
| US-4070521-A | TRACE ELEMENTS, IRON, PHOSPHORUS, OXYGEN, CARBON, NITROGEN | DIAMOND SHAMROCK CORPORATION (US) | 1978-01-24 | — | — | US | disclosed |
| US-4056409-A | METHYLENE CHLORIDE, WATER, ALCOHOL, PHOSPHORIC ACID | DIAMOND SHAMROCK CORPORATION (US) | 1977-11-01 | — | — | US | disclosed |
| US-4008101-A | PHOSPHORIC ACID | DIAMOND SHAMROCK CORPORATION (US) | 1977-02-15 | — | — | US | disclosed |