⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11309568 | 1.00 | — | — | |
| SCHEMBL4632138 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL9959120 | 0.97 | — | — | |
| SCHEMBL10996959 | 0.97 | — | — | |
| SCHEMBL7169009 | 0.77 | — | — | |
| Potassium Ion SCHEMBL10996952 | 0.77 | — | — | |
| Potassium Ion SCHEMBL10996954 | 0.77 | — | — | |
| SCHEMBL12164294 | 0.77 | — | — | |
| SCHEMBL1156182 | 0.73 | — | — | |
| SCHEMBL2379557 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118146188-A | Preparation method of 1, 3-propenoic acid lactone | 苏州祺添新材料股份有限公司 | 2024-06-07 | — | — | CN | disclosed |
| US-RE45310-E1 | Cathode active material, cathode therewith and nonaqueous electrolyte secondary battery | SONY CORPORATION (JP) | 2014-12-30 | — | — | US | disclosed |
| EP-1927889-B1 | Lithographic printing plate precursor | FUJIFILM CORP (JP) | 2014-06-25 | — | — | EP | disclosed |
| US-8377589-B2 | Cathode active material, cathode therewith and nonaqueous electrolyte secondary battery | SONY CORPORATION (JP) | 2013-02-19 | — | — | US | disclosed |
| US-8377589-B2 | Cathode active material, cathode therewith and nonaqueous electrolyte secondary battery | SONY CORPORATION (JP) | 2013-02-19 | — | — | US | disclosed |
| US-8349489-B2 | Cathode active material, cathode therewith and nonaqueous electrolyte secondary battery | SONY CORPORATION (JP) | 2013-01-08 | — | — | US | disclosed |
| US-20120231335-A1 | CATHODE ACTIVE MATERIAL, CATHODE THEREWITH AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | SONY CORPORATION (JP) | 2012-09-13 | — | — | US | disclosed |
| US-20120231335-A1 | CATHODE ACTIVE MATERIAL, CATHODE THEREWITH AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | SONY CORPORATION (JP) | 2012-09-13 | — | — | US | disclosed |
| US-20090202905-A1 | CATHODE ACTIVE MATERIAL, CATHODE THEREWITH AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | SONY CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20090136855-A1 | ANODE, BATTERY, AND METHODS OF MANUFACTURING THEM | SONY CORPORATION (JP) | 2009-05-28 | — | — | US | disclosed |
| EP-1927889-A1 | Lithographic printing plate precursor | FUJIFILM Corporation (JP) | 2008-06-04 | — | — | EP | disclosed |
| EP-1091253-B1 | Plate making process for planographic plate, automatic developing apparatus and recording medium | FUJI PHOTO FILM CO LTD (JP) | 2005-03-30 | — | — | EP | disclosed |
| US-6558873-B1 | Interlayer containing a compound capable of forming a complex with aluminum and a photopolymerizable photosensitive layer containing a photopolymerization initiator, an addition polymerizable compound capable of complexing with aluminum | FUJI PHOTO FILM CO., LTD. (JP) | 2003-05-06 | — | — | US | disclosed |
| EP-1091253-A2 | Plate making process for planographic plate, automatic developing apparatus and recording medium | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1091251-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-11 | — | — | EP | disclosed |
| US-4687727-A | Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1987-08-18 | — | — | US | disclosed |
| US-4511645-A | ALLYL METHACRYLATE-METHACRYLIC ACID COPOLYMER, CURING AGENT, PHOTOINITIATOR | FUJI PHOTO FILM CO., LTD. (JP) | 1985-04-16 | — | — | US | disclosed |