SCHEMBL4632138

SCHEMBL4632138

O=S(=O)(O)C=CCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11309568 1.00
SCHEMBL4632136 1.00
Ammonia Solution, Strong SCHEMBL9959120 0.97
SCHEMBL10996959 0.97
SCHEMBL7169009 0.77
Potassium Ion SCHEMBL10996952 0.77
Potassium Ion SCHEMBL10996954 0.77
SCHEMBL12164294 0.77
SCHEMBL1156182 0.73
SCHEMBL2379557 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119390678-A Trifluoromethyl-containing sultone derivative and preparation method and application thereof 湖北省生物农药工程研究中心 2025-02-07 CN claimed
CN-118561805-A Preparation method of 1, 3-propenoic acid lactone 苏州祺添新材料股份有限公司 2024-08-30 CN claimed
CN-118146188-A Preparation method of 1, 3-propenoic acid lactone 苏州祺添新材料股份有限公司 2024-06-07 CN claimed
EP-2827432-B1 NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY AND BATTERY PACK TOSHIBA KK (JP) 2020-09-02 EP claimed
US-9825330-B2 Nonaqueous electrolyte secondary battery and battery pack KABUSHIKI KAISHA TOSHIBA (JP) 2017-11-21 US claimed
EP-2827432-A1 NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY AND BATTERY PACK Kabushiki Kaisha Toshiba (JP) 2015-01-21 EP claimed
US-20140134477-A1 NONAQUEOUS ELECTROLYTE SECONDARY BATTERY AND BATTERY PACK KABUSHIKI KAISHA TOSHIBA (JP) 2014-05-15 US claimed
CN-103718373-A Non-aqueous electrolyte secondary battery and battery pack TOSHIBA KK 2014-04-09 CN claimed
US-20260103570-A1 ANTIMICROBIAL AND/OR ANTIADHESIVE CROSSLINKING AGENTS AND ANTIMICROBIAL AND/OR ANTIADHESIVE MEDICAL HYDROGELS FORMED THEREFROM BOSTON SCIENTIFIC SCIMED, INC. (US) 2026-04-16 US disclosed
CN-119390678-B Trifluoromethyl-containing sultone derivative and preparation method and application thereof 湖北省生物农药工程研究中心 2025-10-17 CN disclosed
CN-116265450-B Preparation method of propenyl 1, 3-sultone 张家港市国泰华荣化工新材料有限公司 2025-07-04 CN disclosed
CN-119390678-A Trifluoromethyl-containing sultone derivative and preparation method and application thereof 湖北省生物农药工程研究中心 2025-02-07 CN disclosed
CN-119390678-A Trifluoromethyl-containing sultone derivative and preparation method and application thereof 湖北省生物农药工程研究中心 2025-02-07 CN disclosed
CN-118878443-B Preparation method of 1, 3-propenoic acid lactone 上海如鲲新材料股份有限公司 2025-01-21 CN disclosed
US-4687727-A Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1987-08-18 US disclosed
US-4539408-A Process for the preparation of sulphoalkyl quaternary salts AGFA-GEVAERT AKTIENGESELLSCHAFT (DE) 1985-09-03 US disclosed
US-4511645-A ALLYL METHACRYLATE-METHACRYLIC ACID COPOLYMER, CURING AGENT, PHOTOINITIATOR FUJI PHOTO FILM CO., LTD. (JP) 1985-04-16 US disclosed
EP-0104863-A2 Light-sensitive planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1984-04-04 EP disclosed
US-4308390-A Process for the production of sulphoalkyl quaternary salts AGFA-GEVAERT AKTIENGESELLSCHAFT (DE) 1981-12-29 US disclosed
US-4161218-A SURFACTANT MIXTURE OF AN ALKYL- OR ALKYLARYL-POLYALKOXYALKYLENE SULFONATE SALT AND AN ORGANIC SULFONATE TEXACO INC. (US) 1979-07-17 US disclosed