⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL8417552 | 0.91 | — | — | |
| SCHEMBL217832 | 0.91 | — | — | |
| SCHEMBL6655002 | 0.91 | — | — | |
| SCHEMBL3779811 | 0.91 | — | — | |
| SCHEMBL6034546 | 0.91 | — | — | |
| SCHEMBL7543910 | 0.91 | — | — | |
| SCHEMBL829608 | 0.91 | — | — | |
| SCHEMBL1596634 | 0.91 | — | — | |
| SCHEMBL6645096 | 0.91 | — | — | |
| Ammonia Solution, Strong SCHEMBL8743497 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1929512-A2 | HIGH THROUGHPUT CHEMICAL MECHANICAL POLISHING COMPOSITION FOR METAL FILM PLANARIZATION | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2008-06-11 | — | — | EP | disclosed |
| WO-2007019342-A2 | HIGH THROUGHPUT CHEMICAL MECHANICAL POLISHING COMPOSITION FOR METAL FILM PLANARIZATION | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2007-02-15 | — | — | WO | disclosed |