SCHEMBL4635532

SCHEMBL4635532

CCCCCCCCCCOC(O)CC

nearest known ligand 0.50

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 1/20 0.48
USP2 O75604 1/20 0.45
HTT P42858 2/20 0.44
TSHR P16473 1/20 0.42
MEN1 O00255 1/20 0.41
THRB P10828 1/20 0.41
KMT2A Q03164 1/20 0.41
MAPT P10636 1/20 0.41
LPAR3 Q9UBY5 7/20 0.41
LPAR1 Q92633 6/20 0.41
LPAR2 Q9HBW0 3/20 0.41
SPHK1 Q9NYA1 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1978801 1.00 DNM1 (0.48) DNM1USP2HTTTSHRMEN1
SCHEMBL5596274 1.00 DNM1 (0.48) DNM1USP2HTTTSHRMEN1
SCHEMBL1095723 1.00 DNM1 (0.48) DNM1USP2HTTTSHRMEN1
SCHEMBL4100169 1.00 DNM1 (0.48) DNM1USP2HTTTSHRMEN1
SCHEMBL133456 1.00 DNM1 (0.48) DNM1USP2HTTTSHRMEN1
SCHEMBL6021620 1.00 DNM1 (0.48) DNM1USP2HTTTSHRMEN1
SCHEMBL23038765 1.00 DNM1 (0.48) DNM1USP2HTTTSHRMEN1
SCHEMBL4582497 1.00 DNM1 (0.48) DNM1USP2HTTTSHRMEN1
SCHEMBL1095934 0.98 DNM1 (0.45) DNM1USP2HTTTSHRMEN1
Ethylene Glycol SCHEMBL15090416 0.94 MEN1 (0.47) DNM1USP2HTTTSHRMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4200301-A1 PHOSPHOLIPID COMPOUNDS AND USES THEREOF GILEAD SCIENCES, INC. (US) 2023-06-28 EP disclosed
WO-2022046631-A1 PHOSPHOLIPID COMPOUNDS AND USES THEREOF GILEAD SCIENCES, INC. (US) 2022-03-03 WO disclosed
EP-1794199-A4 PHOTOCURABLE RESIN COMPOSITION HITACHI CHEMICAL CO LTD (JP) 2008-02-20 EP disclosed
EP-1794199-A1 PHOTOCURABLE RESIN COMPOSITION Hitachi Chemical Co., Ltd. (JP) 2007-06-13 EP disclosed
WO-2006035683-A1 PHOTOCURABLE RESIN COMPOSITION HITACHI CHEMICAL CO., LTD. (JP) 2006-04-06 WO disclosed