Succinimide

Succinimide

SCHEMBL4639601

CCCCC.O=C1CCC(=O)N1

nearest known ligand 0.61

Full drug profile on Sugi Atlas →

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CRBN Q96SW2 4/20 0.61
LMNA P02545 3/20 0.42
KDM4E B2RXH2 2/20 0.42
CYP2C19 P33261 1/20 0.42
TSHR P16473 1/20 0.39
CYP19A1 P11511 10/20 0.39
ALOX5 P09917 2/20 0.38
POLB P06746 1/20 0.38
KMT2A Q03164 1/20 0.38
DDB1 Q16531 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Succinimide SCHEMBL7039031 0.94 CRBN (0.61) CRBNLMNAKDM4ECYP2C19CYP19A1
Succinimide SCHEMBL27423831 0.94 CRBN (0.61) CRBNLMNAKDM4ECYP2C19CYP19A1
Dodecane SCHEMBL27509294 0.92 CRBN (0.58) CRBNLMNAKDM4ECYP2C19TSHR
Hexadecane SCHEMBL28112342 0.92 CRBN (0.58) CRBNLMNAKDM4ECYP2C19TSHR
Succinimide SCHEMBL22714063 0.88 CRBN (0.69) CRBNLMNAKDM4ECYP2C19TSHR
Succinimide SCHEMBL27673277 0.87 CRBN (0.52) CRBNLMNAKDM4ECYP2C19CYP19A1
Succinimide SCHEMBL27751953 0.85 CRBN (0.50) CRBNLMNAKDM4ECYP2C19CYP19A1
Succinimide SCHEMBL27884254 0.85 CRBN (0.50) CRBNLMNAKDM4ECYP2C19CYP19A1
Succinimide SCHEMBL4404934 0.85 CRBN (0.73) CRBNLMNAKDM4ECYP2C19TSHR
Tetrabuthylammonium SCHEMBL2230716 0.84 SLC22A1 (0.52) CRBNTSHRALOX5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1801619-B1 Substrate comprising two antireflective silicone resin layers between an organic layer and a photoresist layer, method for producing the same and patterning process using the same SHINETSU CHEMICAL CO (JP) 2008-08-06 EP disclosed
EP-1801619-A2 Substrate, method for producing the same, and patterning process using the same Shin-Etsu Chemical Co., Ltd. (JP) 2007-06-27 EP disclosed