SCHEMBL4644749

SCHEMBL4644749

SCc1c2ccccc2cc2ccccc12

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 1/20 0.60
L3MBTL1 Q9Y468 1/20 0.60
ALDH1A1 P00352 7/20 0.44
HSD17B10 Q99714 5/20 0.44
HIF1A Q16665 1/20 0.44
CYP1B1 Q16678 1/20 0.44
CYP1A2 P05177 5/20 0.41
KDM4E B2RXH2 3/20 0.41
HPGD P15428 3/20 0.41
CYP2C19 P33261 2/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
GLA P06280 1/20 0.41
GPR35 Q9HC97 2/20 0.40
POLB P06746 2/20 0.40
CYP3A4 P08684 1/20 0.40
ERBB2 P04626 1/20 0.40
FYN P06241 1/20 0.40
MAOA P21397 1/20 0.40
ACHE P22303 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29707500 0.82 L3MBTL1 (0.42) HTR2AL3MBTL1ALDH1A1HSD17B10HIF1A
SCHEMBL29853795 0.81 IDO1 (0.45) HTR2AL3MBTL1ALDH1A1HSD17B10CYP1A2
SCHEMBL332253 0.81 IDO1 (0.45) HTR2AL3MBTL1ALDH1A1HSD17B10CYP1A2
SCHEMBL23527427 0.79 HTR2A (0.65) HTR2AL3MBTL1ALDH1A1HSD17B10HIF1A
SCHEMBL9445712 0.79 HTR2A (0.65) HTR2AL3MBTL1ALDH1A1HSD17B10HIF1A
SCHEMBL1169916 0.75 HTR2A (0.60) HTR2AL3MBTL1ALDH1A1HSD17B10HIF1A
SCHEMBL7877776 0.75 HTR2A (0.60) HTR2AL3MBTL1ALDH1A1HSD17B10HIF1A
SCHEMBL22288196 0.75 HTR2A (0.60) HTR2AL3MBTL1ALDH1A1HSD17B10HIF1A
SCHEMBL59671 0.75 HTR2A (0.60) HTR2AL3MBTL1ALDH1A1HSD17B10HIF1A
SCHEMBL592824 0.75 L3MBTL1 (1.00) HTR2AL3MBTL1ALDH1A1HSD17B10HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150299437-A1 PREPARATION OF RUBBER REINFORCED WITH GRAPHENE AND CARBON NANOTUBES AND FUNCTIONALIZED ELASTOMERS AND TIRE WITH COMPONENT THE GOODYEAR TIRE & RUBBER COMPANY (US) 2015-10-22 US claimed
EP-1077962-B1 ISOCYANATE DERIVATIZING AGENT AND METHODS OF PRODUCTION AND USE US GOV HEALTH & HUMAN SERV (US) 2005-04-13 EP claimed
EP-4091578-B1 METHOD FOR PRODUCING PLATE DENTURE TOKUYAMA DENTAL CORP (JP) 2024-10-09 EP disclosed
US-11857385-B2 Method of producing plate denture, curable composition for stereolithography, and plate denture production kit TOKUYAMA DENTAL CORPORATION (JP) 2024-01-02 US disclosed
US-11803122-B2 Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-31 US disclosed
CN-114929158-B Method for producing denture, curable composition for photoforming, and kit for producing denture 株式会社德山齿科 2023-10-20 CN disclosed
US-20230137898-A1 METHOD OF PRODUCING PLATE DENTURE, CURABLE COMPOSITION FOR STEREOLITHOGRAPHY, AND PLATE DENTURE PRODUCTION KIT TOKUYAMA DENTAL CORPORATION (JP) 2023-05-04 US disclosed
EP-4091578-A1 METHOD FOR PRODUCING PLATE DENTURE, CURABLE STEREOLITHOGRAPHIC COMPOSITION, AND PLATE DENTURE PRODUCTION KIT Tokuyama Dental Corporation (JP) 2022-11-23 EP disclosed
CN-114929158-A Method for producing a denture, curable composition for photo-molding, and kit for producing a denture 株式会社德山齿科 2022-08-19 CN disclosed
CN-114306635-A Compounds comprising a cleavable linker and uses thereof 尹图赛利有限公司 2022-04-12 CN disclosed
CN-114306634-A Compounds comprising a cleavable linker and uses thereof 尹图赛利有限公司 2022-04-12 CN disclosed
US-20050250868-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-10 US disclosed
EP-1591098-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-02 EP disclosed
US-20050053861-A1 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2005-03-10 US disclosed
US-20040186195-A1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORPORATION (JP) 2004-09-23 US disclosed
EP-1431315-A2 Photopolymerization initiator and photopolymerizable composition Tokuyama Corporation (JP) 2004-06-23 EP disclosed
US-5470994-A Sulfonium salts and the use thereof as photoinitiators EASTMAN KODAK COMPANY (US) 1995-11-28 US disclosed
EP-0331413-B1 NOVEL SULFONIUM SALTS AND THE USE THEREOF AS PHOTOINITIATORS EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1993-04-14 EP disclosed
US-4933377-A Novel sulfonium salts and the use thereof as photoinitiators EASTMAN KODAK COMPANY, A NJ CORP. 1990-06-12 US disclosed
EP-0331413-A1 Novel sulfonium salts and the use thereof as photoinitiators EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-09-06 EP disclosed