⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12980060 | 0.90 | — | — | |
| SCHEMBL4647958 | 0.82 | — | — | |
| SCHEMBL133500 | 0.79 | — | — | |
| SCHEMBL6821672 | 0.74 | — | — | |
| SCHEMBL977268 | 0.71 | — | — | |
| SCHEMBL17385702 | 0.69 | — | — | |
| SCHEMBL12980186 | 0.69 | — | — | |
| SCHEMBL25227011 | 0.67 | — | — | |
| SCHEMBL29666 | 0.67 | — | — | |
| SCHEMBL1112031 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9465291-B2 | Radiation-sensitive resin composition, polymer, compound, and method for producing compound | JSR CORPORATION (JP) | 2016-10-11 | — | — | US | disclosed |
| US-9261780-B2 | Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound | JSR CORPORATION (JP) | 2016-02-16 | — | — | US | disclosed |
| US-20140186771-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | JSR CORPORATION (JP) | 2014-07-03 | — | — | US | disclosed |
| US-20140031376-A1 | IMINOPROPENE COMPOUND AND USE THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-01-30 | — | — | US | disclosed |
| US-20140004463-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2014-01-02 | — | — | US | disclosed |
| US-8618329-B2 | Iminopropene compound and use thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-12-31 | — | — | US | disclosed |
| US-20130150392-A1 | IMINOPROPENE COMPOUND AND USE THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-06-13 | — | — | US | disclosed |
| US-20130143160-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2013-06-06 | — | — | US | disclosed |
| US-8410316-B2 | Iminopropene compound and use thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-04-02 | — | — | US | disclosed |
| US-20130022912-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2013-01-24 | — | — | US | disclosed |
| CN-101365681-B | Iminopropene compound and use thereof | SUMITOMO CHEMICAL CO | 2013-01-02 | — | — | CN | disclosed |
| US-20110319437-A1 | IMINOPROPENE COMPOUND AND USE THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-8084644-B2 | Agricultural pesticide; Wide variety of compounds, for example phenyl N-phenyl-3-(phenylthio)thioacrylimidate; formula X-CH=CH-C(-Y)=N-Z where X, Y and Z are variable | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-27 | — | — | US | disclosed |
| CN-101365681-A | Iminopropene compound and use thereof | SUMITOMO CHEMICAL CO (JP) | 2009-02-11 | — | — | CN | disclosed |
| EP-1957459-A2 | IMINOPROPENE COMPOUND AND USE THEREOF | Sumitomo Chemical Company, Limited (JP) | 2008-08-20 | — | — | EP | disclosed |
| WO-2007063702-A2 | IMINOPROPENE COMPOUND AND USE THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-06-07 | — | — | WO | disclosed |