⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL975082 | 0.97 | — | — | |
| SCHEMBL17385642 | 0.97 | — | — | |
| SCHEMBL12979369 | 0.97 | — | — | |
| SCHEMBL17385702 | 0.97 | — | — | |
| SCHEMBL12980186 | 0.97 | — | — | |
| SCHEMBL17385701 | 0.97 | — | — | |
| SCHEMBL133500 | 0.90 | — | — | |
| SCHEMBL12980060 | 0.78 | — | — | |
| SCHEMBL130105 | 0.76 | — | — | |
| SCHEMBL4645019 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 143 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0623116-A1 | AMINO ACID DERIVATIVES AS PAF-RECEPTOR ANTAGONISTS | BRITISH BIO-TECHNOLOGY LIMITED (GB) | 1994-11-09 | — | — | EP | claimed |
| WO-1993014072-A1 | AMINO ACID DERIVATIVES AS PAF-RECEPTOR ANTAGONISTS | BRITISH BIO-TECHNOLOGY LIMITED (GB) | 1993-07-22 | — | — | WO | claimed |
| US-20240199553-A1 | DIFLUOROMETHYLATION REACTION OF HETEROCYCLIC RING USING TETRAFLUOROETHYLENE | AGC Inc. (JP) | 2024-06-20 | — | — | US | disclosed |
| EP-4385977-A1 | DIFLUOROMETHYLATION REACTION OF HETEROCYCLIC RING USING TETRAFLUOROETHYLENE | AGC INC. (JP) | 2024-06-19 | — | — | EP | disclosed |
| WO-2024116575-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024116577-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024116576-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID-GENERATING AGENT | JSR株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024105962-A1 | RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-23 | — | — | WO | disclosed |
| WO-2024106020-A1 | RADIATION SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-23 | — | — | WO | disclosed |
| US-20240142876-A1 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | JSR CORPORATION (JP) | 2024-05-02 | — | — | US | disclosed |
| WO-2024090041-A1 | RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-02 | — | — | WO | disclosed |
| US-5415966-A | Image forming system of low ozone generation | KONICA CORPORATION (JP) | 1995-05-16 | — | — | US | disclosed |
| EP-0627411-A1 | Azine-substituted phenylacetic acid derivatives and fungicides containing them | BASF Aktiengesellschaft (DE) | 1994-12-07 | — | — | EP | disclosed |
| EP-0623116-A1 | AMINO ACID DERIVATIVES AS PAF-RECEPTOR ANTAGONISTS | BRITISH BIO-TECHNOLOGY LIMITED (GB) | 1994-11-09 | — | — | EP | disclosed |
| EP-0623116-A1 | AMINO ACID DERIVATIVES AS PAF-RECEPTOR ANTAGONISTS | BRITISH BIO-TECHNOLOGY LIMITED (GB) | 1994-11-09 | — | — | EP | disclosed |
| WO-1993014072-A1 | AMINO ACID DERIVATIVES AS PAF-RECEPTOR ANTAGONISTS | BRITISH BIO-TECHNOLOGY LIMITED (GB) | 1993-07-22 | — | — | WO | disclosed |
| WO-1993014072-A1 | AMINO ACID DERIVATIVES AS PAF-RECEPTOR ANTAGONISTS | BRITISH BIO-TECHNOLOGY LIMITED (GB) | 1993-07-22 | — | — | WO | disclosed |
| EP-0531812-A1 | Maillard reaction inhibitor, process for producing it, composition containing it and the use thereof | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1993-03-17 | — | — | EP | disclosed |
| US-5024912-A | 5H-dibenzo(A,D) cycloheptanylidene derivative and 5H-dibenzo (A,D) cycloheptenylidene derivative, and electrophotographic photosensitive member using the same | CANON KABUSHIKI KAISHA (JP) | 1991-06-18 | — | — | US | disclosed |
| US-5024912-A | 5H-dibenzo(A,D) cycloheptanylidene derivative and 5H-dibenzo (A,D) cycloheptenylidene derivative, and electrophotographic photosensitive member using the same | CANON KABUSHIKI KAISHA (JP) | 1991-06-18 | — | — | US | disclosed |