⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL634945 | 1.00 | — | — | |
| SCHEMBL1276561 | 0.79 | — | — | |
| SCHEMBL1275776 | 0.79 | — | — | |
| SCHEMBL7637338 | 0.78 | — | — | |
| SCHEMBL6065119 | 0.76 | — | — | |
| SCHEMBL4647253 | 0.76 | — | — | |
| SCHEMBL5406825 | 0.73 | — | — | |
| SCHEMBL17961621 | 0.72 | — | — | |
| SCHEMBL17961633 | 0.72 | — | — | |
| SCHEMBL19244089 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260117117-A1 | PHOTOCHROMIC COMPOUND, PHOTOCHROMIC COMPOSITION, PHOTOCHROMIC ARTICLE, AND EYEGLASSES | HOYA LENS THAILAND LTD. (TH) | 2026-04-30 | — | — | US | disclosed |
| EP-4733304-A2 | PHOTOCHROMIC COMPOUND, PHOTOCHROMIC COMPOSITION, PHOTOCHROMIC ARTICLE, AND EYEGLASSES | HOYA Lens Thailand Ltd. (TH) | 2026-04-29 | — | — | EP | disclosed |
| EP-4198102-B1 | PHOTOCHROMIC COMPOUND, PHOTOCHROMIC COMPOSITION, PHOTOCHROMIC ARTICLE, AND EYEGLASSES | HOYA LENS THAILAND LTD (TH) | 2026-04-01 | — | — | EP | disclosed |
| US-12577455-B2 | Photochromic compound, photochromic composition, photochromic article and spectacles | HOYA LENS THAILAND LTD. (TH) | 2026-03-17 | — | — | US | disclosed |
| US-20260042742-A1 | PHOTOCHROMIC COMPOUND, PHOTOCHROMIC COMPOSITION, PHOTOCHROMIC ARTICLE AND EYEGLASSES | HOYA LENS THAILAND LTD. (TH) | 2026-02-12 | — | — | US | disclosed |
| EP-4674923-A1 | PHOTOCHROMIC COMPOUND, PHOTOCHROMIC COMPOSITION, PHOTOCHROMIC ARTICLE, AND EYEGLASSES | Hoya Lens Thailand Ltd. (TH) | 2026-01-07 | — | — | EP | disclosed |
| EP-4674924-A1 | PHOTOCHROMIC COMPOUND, PHOTOCHROMIC COMPOSITION, PHOTOCHROMIC ARTICLE, AND EYEGLASSES | Hoya Lens Thailand Ltd. (TH) | 2026-01-07 | — | — | EP | disclosed |
| EP-4270067-B1 | PHOTOCHROMIC COMPOSITION, PHOTOCHROMIC ARTICLE, AND GLASSES | HOYA LENS THAILAND LTD (TH) | 2025-12-03 | — | — | EP | disclosed |
| EP-4269532-B1 | PHOTOCHROMIC COMPOSITION, PHOTOCHROMIC ARTICLE, AND EYEGLASSES | HOYA LENS THAILAND LTD (TH) | 2025-12-03 | — | — | EP | disclosed |
| EP-4549533-A1 | PHOTOCHROMIC COMPOSITION, PHOTOCHROMIC ARTICLE, AND SPECTACLES | HOYA Lens Thailand Ltd. (TH) | 2025-05-07 | — | — | EP | disclosed |
| US-20180244931-A1 | PHOTOCHROMIC COATING COMPOSITION | TOKUYAMA CORPORATION (JP) | 2018-08-30 | — | — | US | disclosed |
| EP-3345954-A1 | POLYROTAXANE, PRODUCTION METHOD THEREFOR, AND OPTICAL COMPOSITION CONTAINING SAID POLYROTAXANE | Tokuyama Corporation (JP) | 2018-07-11 | — | — | EP | disclosed |
| EP-3330751-A1 | PHOTOCHROMIC COATING COMPOSITION | Tokuyama Corporation (JP) | 2018-06-06 | — | — | EP | disclosed |
| US-20180030341-A1 | PROCESS FOR PRODUCING A PHOTOCHROMIC CURED BODY | TOKUYAMA CORPORATION (JP) | 2018-02-01 | — | — | US | disclosed |
| EP-3269774-A1 | METHOD FOR PRODUCING PHOTOCHROMIC CURED BODY | Tokuyama Corporation (JP) | 2018-01-17 | — | — | EP | disclosed |
| EP-3070142-A1 | PHOTOCHROMIC COMPOSITION | Tokuyama Corporation (JP) | 2016-09-21 | — | — | EP | disclosed |
| US-20160222285-A1 | PHOTOCHROMIC COMPOSITION | TOKUYAMA CORPORATION (JP) | 2016-08-04 | — | — | US | disclosed |
| CN-105683334-A | Photochromic composition | 株式会社德山 | 2016-06-15 | — | — | CN | disclosed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |