SCHEMBL4645219

SCHEMBL4645219

CC(C)(C1CCC(SCC2CS2)CC1)C1CCC(SCC2CS2)CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27551122 0.79
SCHEMBL4646674 0.78
SCHEMBL4647097 0.77
SCHEMBL4649030 0.77
SCHEMBL4646373 0.74
SCHEMBL2390237 0.73 SLC2A1 (0.35)
SCHEMBL4648962 0.71
SCHEMBL4862732 0.71
SCHEMBL4998484 0.69
SCHEMBL2770464 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104053657-A Process for producing thioepoxy optical material and polymerizable composition thereof KOC SOLUTION CO LTD 2014-09-17 CN disclosed
CN-104039860-A Polymerizable composition for thioepoxy-based optical material and method for producing thioepoxy-based optical material KOC SOLUTION CO LTD 2014-09-10 CN disclosed
CN-104024300-A POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL CONTAINING THIOEPOXY COMPOUND, AND PREPARATION METHOD OF OPTICAL MATERIAL KOC SOLUTION CO LTD 2014-09-03 CN disclosed
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1962139-A1 Negative resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-08-27 EP disclosed