⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4646373 | 0.83 | — | — | |
| SCHEMBL4646674 | 0.82 | — | — | |
| SCHEMBL2390237 | 0.81 | SLC2A1 (0.35) | — | |
| SCHEMBL4862732 | 0.79 | — | — | |
| SCHEMBL4998484 | 0.77 | — | — | |
| SCHEMBL4645219 | 0.77 | — | — | |
| SCHEMBL4647767 | 0.76 | — | — | |
| SCHEMBL2770464 | 0.75 | — | — | |
| SCHEMBL1276570 | 0.74 | — | — | |
| SCHEMBL2768043 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112118955-B | Automatic injection method of mold for monomer for episulfide optical material | 可奥熙搜路司有限公司 | 2022-04-19 | — | — | CN | disclosed |
| CN-112118955-A | Automatic injection method of mold for monomer for episulfide optical material | 可奥熙搜路司有限公司 | 2020-12-22 | — | — | CN | disclosed |
| CN-107667126-A | Thioopoxy-based ultrahigh-refractive-index optical resin composition and preparation method of thioepoxy-based optical material | 可奥熙搜路司有限公司 | 2018-02-06 | — | — | CN | disclosed |
| CN-107548409-A | The preparation method of thio epoxy base system optical material and thio epoxy base system polymerizable composition for optical material | 可奥熙搜路司有限公司 | 2018-01-05 | — | — | CN | disclosed |
| CN-104024300-B | Sulfur-bearing is for optical material polymer composition and the optical material manufacture method of epoxy radicals (thioepoxy) compound | KOC SOLUTION CO.,LTD. (KR) | 2016-11-30 | — | — | CN | disclosed |
| CN-105968409-A | Polymeric composition for thioepoxy-based optical material and method of manufacturing thioepoxy-based optical material | 可奥熙搜路司有限公司 | 2016-09-28 | — | — | CN | disclosed |
| CN-104053657-A | Process for producing thioepoxy optical material and polymerizable composition thereof | KOC SOLUTION CO LTD | 2014-09-17 | — | — | CN | disclosed |
| CN-104039860-A | Polymerizable composition for thioepoxy-based optical material and method for producing thioepoxy-based optical material | KOC SOLUTION CO LTD | 2014-09-10 | — | — | CN | disclosed |
| CN-104024300-A | POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL CONTAINING THIOEPOXY COMPOUND, AND PREPARATION METHOD OF OPTICAL MATERIAL | KOC SOLUTION CO LTD | 2014-09-03 | — | — | CN | disclosed |
| CN-102770422-A | Manufacturing method for episulphide compound | MITSUBISHI GAS CHEMICAL CO | 2012-11-07 | — | — | CN | disclosed |
| CN-102762637-A | Composition for optical material, method for producing same, and optical material obtained from composition for optical material | MITSUBISHI GAS CHEMICAL CO | 2012-10-31 | — | — | CN | disclosed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |
| CN-1711213-A | Dispersoid containing metal-oxygen bond, metal oxide film and monomolecular film | NIPPON SODA CO (JP) | 2005-12-21 | — | — | CN | disclosed |