SCHEMBL4645823

SCHEMBL4645823

CCCCCCOCc1c2ccccc2cc2ccccc12

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.42
HTR2A P28223 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
TLR8 Q9NR97 2/20 0.41
CNR1 P21554 2/20 0.40
CNR2 P34972 2/20 0.40
FAAH O00519 1/20 0.40
MGLL Q99685 1/20 0.40
GPBAR1 Q8TDU6 1/20 0.39
LMNA P02545 2/20 0.38
TSHR P16473 2/20 0.38
ALDH1A1 P00352 1/20 0.38
CYP2C9 P11712 1/20 0.38
EPHX1 P07099 1/20 0.38
NR5A1 Q13285 1/20 0.38
ABCB11 O95342 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP2D6 P10635 1/20 0.37
SCN1A P35498 1/20 0.37
SCN2A Q99250 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8372908 0.90 L3MBTL1 (0.42) MAPTHTR2AL3MBTL1TLR8LMNA
SCHEMBL3694797 0.85 L3MBTL1 (0.43) HTR2AL3MBTL1ALDH1A1CYP2C9EPHX1
SCHEMBL3697894 0.81 HTR2A (0.46) HTR2AL3MBTL1TSHRALDH1A1CYP2C9
SCHEMBL8373689 0.79 HTR2A (0.50) HTR2AL3MBTL1TSHRALDH1A1CYP2C9
SCHEMBL2796738 0.78 HTR2A (0.58) HTR2AL3MBTL1TSHRALDH1A1CYP2C9
SCHEMBL10361917 0.78 MAPT (0.40) MAPTHTR2AL3MBTL1GPBAR1LMNA
SCHEMBL23089961 0.78 TLR8 (0.48) MAPTL3MBTL1TLR8CNR1CNR2
SCHEMBL23089946 0.78 TLR8 (0.48) MAPTL3MBTL1TLR8CNR1CNR2
SCHEMBL23089944 0.78 TLR8 (0.48) MAPTL3MBTL1TLR8CNR1CNR2
SCHEMBL3999665 0.78 TLR8 (0.48) MAPTL3MBTL1TLR8CNR1CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4091578-B1 METHOD FOR PRODUCING PLATE DENTURE TOKUYAMA DENTAL CORP (JP) 2024-10-09 EP disclosed
US-11857385-B2 Method of producing plate denture, curable composition for stereolithography, and plate denture production kit TOKUYAMA DENTAL CORPORATION (JP) 2024-01-02 US disclosed
CN-114929158-B Method for producing denture, curable composition for photoforming, and kit for producing denture 株式会社德山齿科 2023-10-20 CN disclosed
US-20230137898-A1 METHOD OF PRODUCING PLATE DENTURE, CURABLE COMPOSITION FOR STEREOLITHOGRAPHY, AND PLATE DENTURE PRODUCTION KIT TOKUYAMA DENTAL CORPORATION (JP) 2023-05-04 US disclosed
EP-4091578-A1 METHOD FOR PRODUCING PLATE DENTURE, CURABLE STEREOLITHOGRAPHIC COMPOSITION, AND PLATE DENTURE PRODUCTION KIT Tokuyama Dental Corporation (JP) 2022-11-23 EP disclosed
CN-114929158-A Method for producing a denture, curable composition for photo-molding, and kit for producing a denture 株式会社德山齿科 2022-08-19 CN disclosed
EP-1591098-B1 Cationically curable composition for dental use TOKUYAMA CORP (JP) 2008-08-13 EP disclosed
US-7365106-B2 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2008-04-29 US disclosed
EP-1431315-B1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORP (JP) 2007-10-17 EP disclosed
US-20050250868-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-10 US disclosed
EP-1591098-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-02 EP disclosed
US-20040186195-A1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORPORATION (JP) 2004-09-23 US disclosed
EP-1431315-A2 Photopolymerization initiator and photopolymerizable composition Tokuyama Corporation (JP) 2004-06-23 EP disclosed