⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21635482 | 0.64 | — | — | |
| SCHEMBL21635484 | 0.59 | — | — | |
| SCHEMBL20601567 | 0.58 | — | — | |
| SCHEMBL13227493 | 0.56 | GAA (0.35) | — | |
| SCHEMBL4745060 | 0.52 | — | — | |
| SCHEMBL1402908 | 0.50 | — | — | |
| SCHEMBL21409589 | 0.50 | — | — | |
| SCHEMBL2733967 | 0.50 | — | — | |
| SCHEMBL20601576 | 0.50 | — | — | |
| SCHEMBL733109 | 0.49 | TSHR (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |