Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4647198 | 0.87 | — | — | |
| SCHEMBL10071782 | 0.82 | TSHR (0.35) | — | |
| SCHEMBL14355428 | 0.82 | — | — | |
| SCHEMBL5506277 | 0.78 | ALDH1A1 (0.44) | ALDH1A1 | |
| SCHEMBL16877532 | 0.75 | — | — | |
| SCHEMBL18389143 | 0.73 | — | — | |
| SCHEMBL635199 | 0.72 | — | — | |
| SCHEMBL5895150 | 0.71 | — | — | |
| SCHEMBL10038449 | 0.71 | — | — | |
| SCHEMBL24253 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6201061-B1 | CURING A RESIN FOR OPTICAL USE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-03-13 | — | — | US | claimed |
| US-6197226-B1 | COMPRISING DIPPING RESIN INTO A LIQUID CONTAINING POLAR COMPOUND SELECTED FROM POLAR INORGANIC COMPOUNDS AND POLAR ORGANIC COMPOUNDS AND TINTING RESIN, WHEREIN RESIN IS OBTAINED BY CURING BY POLYMERIZATION A SULFUR CONTAINING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY (JP) | 2001-03-06 | — | — | US | claimed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |
| EP-1120667-B1 | Process for production of optical material | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-06-22 | — | — | EP | disclosed |
| EP-1099721-B1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-01-12 | — | — | EP | disclosed |
| US-6472495-B1 | RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-10-29 | — | — | US | disclosed |
| US-6444146-B2 | DISCOLORATION INHIBITION | MITSUBISHI GAS CHEMICAL CO. (JP) | 2002-09-03 | — | — | US | disclosed |
| EP-1120667-A2 | Process for production of optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-08-01 | — | — | EP | disclosed |
| US-20010008278-A1 | Process for production of optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2001-07-19 | — | — | US | disclosed |
| EP-1099721-A1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-05-16 | — | — | EP | disclosed |