SCHEMBL4655815

SCHEMBL4655815

O=S(=O)(Oc1ccc([S+](c2ccccc2)c2ccccc2)cc1)c1ccc2ccc3cccc4ccc1c2c34

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 5/20 0.34
L3MBTL1 Q9Y468 3/20 0.33
HTT P42858 2/20 0.33
CYP1A2 P05177 2/20 0.33
LMNA P02545 2/20 0.33
MAOB P27338 1/20 0.33
ERBB2 P04626 1/20 0.33
FYN P06241 1/20 0.33
MAOA P21397 1/20 0.33
ACHE P22303 1/20 0.33
AHR P35869 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
ENPP2 Q13822 2/20 0.33
CNR1 P21554 1/20 0.33
CNR2 P34972 1/20 0.33
ENPP3 O14638 1/20 0.33
ENPP1 P22413 1/20 0.33
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
NPC1 O15118 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28747912 0.87 CYP1A2 (0.40) TDP1L3MBTL1HTTCYP1A2LMNA
Diphenylsulfane SCHEMBL2904054 0.82 STS (0.40) TDP1L3MBTL1HTTCYP1A2LMNA
SCHEMBL3195405 0.80 TDP1 (0.39) TDP1L3MBTL1HTTLMNASMN1; SMN2
SCHEMBL450356 0.79 NR4A1 (0.39) TDP1L3MBTL1CYP1A2ERBB2FYN
Iodobenzene SCHEMBL2903889 0.79 TDP1 (0.45) TDP1L3MBTL1HTTCYP1A2LMNA
SCHEMBL28770062 0.78 CA1 (0.46) TDP1L3MBTL1HTTCYP1A2LMNA
SCHEMBL2900933 0.78 PPARG (0.32) TDP1L3MBTL1ALDH1A1HPGDMAPT
Diphenylsulfane SCHEMBL2898293 0.78 KMT2A (0.39) TDP1L3MBTL1HTTCYP1A2LMNA
Hydrogen Sulfide SCHEMBL14894996 0.77 CA1 (0.45) TDP1L3MBTL1HTTCYP1A2LMNA
Diphenylsulfane SCHEMBL2900932 0.76 TDP1 (0.32) TDP1L3MBTL1HTTLMNAMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1640804-B1 Positive-tone radiation-sensitive resin composition JSR CORP (JP) 2008-11-19 EP disclosed
US-7335457-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-02-26 US disclosed
US-20060078821-A1 A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication JSR CORPORATION (JP) 2006-04-13 US disclosed
EP-1640804-A2 Positive-tone radiation-sensitive resin composition JSR Corporation (JP) 2006-03-29 EP disclosed