⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL809925 | 0.83 | — | — | |
| SCHEMBL18599190 | 0.83 | — | — | |
| SCHEMBL10531455 | 0.81 | — | — | |
| SCHEMBL2733070 | 0.81 | — | — | |
| SCHEMBL29234848 | 0.78 | — | — | |
| SCHEMBL8734917 | 0.76 | — | — | |
| SCHEMBL29130089 | 0.76 | — | — | |
| SCHEMBL6106227 | 0.76 | NPSR1 (0.31) | — | |
| SCHEMBL11453538 | 0.73 | — | — | |
| SCHEMBL28879729 | 0.73 | CES2 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1043 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4404866-A1 | 3D PRINTING RESIN WITH SEPARATION EFFECT | PRO3DURE MEDICAL GMBH (DE) | 2024-07-31 | — | — | EP | claimed |
| WO-2023046869-A1 | 3D PRINTING RESIN WITH SEPARATION EFFECT | Pro3dure Medical GmbH (DE) | 2023-03-30 | — | — | WO | claimed |
| EP-4154842-A1 | 3D PRINTING RESIN WITH SEPARATION EFFECT | PRO3DURE MEDICAL GMBH (DE) | 2023-03-29 | — | — | EP | claimed |
| CN-112321984-B | Silicon-modified 3D printing photocuring resin, 3D printing product and application thereof | 广东省瑞晟新材料科技有限公司 | 2023-03-10 | — | — | CN | claimed |
| CN-111592620-B | Photocuring material for 3D printing | 广东省瑞晟新材料科技有限公司 | 2022-11-15 | — | — | CN | claimed |
| CN-111491776-B | Hybrid photopolymer compositions for additive manufacturing | 佩什托普公司 | 2022-06-03 | — | — | CN | claimed |
| US-20220056281-A1 | APPLICATION OF ANTIMICROBIAL COATINGS USING ATMOSPHERIC PRESSURE PLASMA SPRAY SYSTEMS | TRITON SYSTEMS, INC. | 2022-02-24 | — | — | US | claimed |
| EP-3266815-B1 | STABILIZED MATRIX-FILLED LIQUID RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | COVESTRO NETHERLANDS BV (NL) | 2021-11-03 | — | — | EP | claimed |
| US-10919909-B2 | Photoinitiated reactions | LINTFIELD LIMITED (GB) | 2021-02-16 | — | — | US | claimed |
| WO-2020191690-A1 | PHOTO-CURABLE COMPOSITIONS FOR ADDITIVE MANUFACTURING | HENKEL AG & CO. KGAA (DE) | 2020-10-01 | — | — | WO | claimed |
| WO-2000003300-A1 | STEREOLITHOGRAPHIC COMPOSITION FOR PREPARING POLYETHYLENE-LIKE ARTICLES | DSM N.V. (NL) | 2000-01-20 | — | — | WO | claimed |
| US-6011077-A | DERIVATIVE OF A POLYVINYL ALCOHOL COMPRISING UNITS CONTAINING CROSSLINKABLE OLEFINICALLY UNSATURATED GROUPS, AND UNITS CONTAINING A BONDED PHOTOINITATOR | NOVARTIS AG (CH) | 2000-01-04 | — | — | US | claimed |
| EP-0506616-B1 | Photosensitive acrylate mixture | CIBA GEIGY AG (CH) | 1998-01-21 | — | — | EP | claimed |
| EP-0605361-B1 | Photosensitive compositions | CIBA GEIGY AG (CH) | 1997-04-02 | — | — | EP | claimed |
| US-5487966-A | Photosensitive compositions | CIBA-GEIGY CORPORATION (US) | 1996-01-30 | — | — | US | claimed |
| EP-0517657-B1 | Photosensitive compositions | CIBA GEIGY AG (CH) | 1995-12-27 | — | — | EP | claimed |
| US-5476749-A | Blend of acrylated polyurethane, unsaturated compound and photoinitiator | CIBA-GEIGY CORPORATION (US) | 1995-12-19 | — | — | US | claimed |
| US-5476748-A | Containing liquid epoxy resin, acrylated ester, photointiator and hydroxyl terminated polyethers, polyesters, or polyurethanes | CIBA-GEIGY CORPORATION (US) | 1995-12-19 | — | — | US | claimed |
| EP-0378144-B1 | Photocurable compositions | CIBA GEIGY AG (CH) | 1995-03-08 | — | — | EP | claimed |
| EP-0378144-A2 | Photocurable compositions | CIBA-GEIGY AG (CH) | 1990-07-18 | — | — | EP | claimed |