SCHEMBL4679293

SCHEMBL4679293

CCCCC[n+]1cccc2ccccc21

nearest known ligand 0.93

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.93
MEN1 O00255 1/20 0.93
RGS12 O14924 1/20 0.93
NPC1 O15118 1/20 0.93
USP2 O75604 1/20 0.93
LMNA P02545 1/20 0.93
HSP90AA1 P07900 1/20 0.93
THRB P10828 1/20 0.93
MAPK1 P28482 1/20 0.93
HTT P42858 1/20 0.93
RAD52 P43351 1/20 0.93
RAB9A P51151 1/20 0.93
KMT2A Q03164 1/20 0.93
MCL1 Q07820 1/20 0.93
SMN1; SMN2 Q16637 1/20 0.93
NPSR1 Q6W5P4 1/20 0.93
BCHE P06276 13/20 0.81
ACHE P22303 13/20 0.81

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4071951 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
SCHEMBL1412685 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
SCHEMBL1963218 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
Fluoride Ion SCHEMBL18804796 0.98 KDM4E (0.90) KDM4EMEN1RGS12NPC1USP2
SCHEMBL29721510 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
SCHEMBL1960573 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
SCHEMBL4061564 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
SCHEMBL9319117 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
SCHEMBL1412766 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2
SCHEMBL4068375 0.98 KDM4E (0.97) KDM4EMEN1RGS12NPC1USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2007087099-A2 METHOD OF REMOVING SCALE AND ACIDIC COMPOSITION USED THEREOF JOHNSONDIVERSEY, INC. (US) 2007-08-02 WO claimed
CN-115894359-A C-N axis chiral 4-quinolinone compound and preparation and application thereof 中山大学 2023-04-04 CN disclosed
US-8241740-B2 Layer laminated to support; ionization radiation; curing using free radical catalyst; image display and polarization plates FUJIFILM CORPORATION (JP) 2012-08-14 US disclosed
US-20080234461-A1 Antireflective Film, Method of Manufacturing Antireflective Film, Polarizing Plate and Image Display Device Using the Same FUJIFILM CORPORATION (JP) 2008-09-25 US disclosed
EP-1298490-B1 Photopolymerizable composition and recording material FUJIFILM CORP (JP) 2008-08-13 EP disclosed
US-7220529-B2 Photopolymerizable composition and recording material using the same FUJIFILM CORPORATION (JP) 2007-05-22 US disclosed
WO-2006095885-A1 ANTIREFLECTIVE FILM, METHOD OF MANUFUCTURING ANTIREFLECTIVE FILM, POLARIZING PLATE AND IMAGE DISPLAY DEVICE USING THE SAME FUJIFILM CORPORATION (JP) 2006-09-14 WO disclosed
US-20050186504-A1 Photopolymerizable composition and recording material using the same FUJI PHOTO FILM CO., LTD. 2005-08-25 US disclosed
US-6919159-B2 Photopolymerizable composition and recording material using the same FUJI PHOTO FILM CO., LTD. (JP) 2005-07-19 US disclosed
US-6830861-B2 Photosensitivity; sharp images; high contrast FUJI PHOTO FILM CO., LTD. (JP) 2004-12-14 US disclosed
US-20030129523-A1 Photopolymerizable composition and recording material using the same FUJIFILM CORPORATION (JP) 2003-07-10 US disclosed
US-20030073025-A1 Recording material FUJI PHOTO FILM CO., LTD. 2003-04-17 US disclosed
US-20030064208-A1 Inkjet recording sheet FUJI PHOTO FILM CO., LTD. 2003-04-03 US disclosed
EP-1298490-A2 Photopolymerizable composition and recording material Fuji Photo Film Co., Ltd. (JP) 2003-04-02 EP disclosed
US-20020182530-A1 Polymerizable compound having an ethylenic unsaturated bond, a methine dye, and a radical generator that interacts with the dye to generate a radical FUJI PHOTO FILM CO., LTD. 2002-12-05 US disclosed
EP-1262828-A1 Recording material FUJI PHOTO FILM CO., LTD. (JP) 2002-12-04 EP disclosed
EP-1260379-A2 Inkjet recording sheet FUJI PHOTO FILM CO., LTD. (JP) 2002-11-27 EP disclosed
US-20020168494-A1 Photopolymerizable composition and photosensitive thermal recording material FUJI PHOTO FILM CO., LTD. 2002-11-14 US disclosed
US-20020142244-A1 Photopolymerizable composition and recording material FUJI PHOTO FILM CO., LTD. 2002-10-03 US disclosed
US-4679124-A TETRACYANOQUINODIMETHAN COMPLEX SALT MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1987-07-07 US disclosed