Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.42 |
| ▸ | ACP1 | P24666 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.40 |
| ▸ | MEN1 | O00255 | 4/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | BLM | P54132 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.38 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.38 |
| ▸ | ADORA2B | P29275 | 1/20 | 0.38 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.38 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.38 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 3/20 | 0.38 |
| ▸ | RAB9A | P51151 | 3/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.38 |
| ▸ | NFKB2 | Q00653 | 2/20 | 0.38 |
| ▸ | RELA | Q04206 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22549081 | 0.96 | L3MBTL1 (0.47) | L3MBTL1ACP1KMT2AMEN1ALDH1A1 | |
| SCHEMBL12198413 | 0.94 | ACP1 (0.48) | L3MBTL1ACP1KMT2AMEN1ALDH1A1 | |
| SCHEMBL436625 | 0.92 | KMT2A (0.38) | L3MBTL1ACP1KMT2AMEN1ALDH1A1 | |
| SCHEMBL13140682 | 0.92 | ACP1 (0.37) | L3MBTL1ACP1KMT2AMEN1ALDH1A1 | |
| SCHEMBL11675965 | 0.91 | ACP1 (0.39) | L3MBTL1ACP1KMT2AMEN1ALDH1A1 | |
| SCHEMBL13140683 | 0.90 | L3MBTL1 (0.38) | L3MBTL1ACP1KMT2AMEN1ALDH1A1 | |
| SCHEMBL18053209 | 0.89 | KDM4E (0.41) | L3MBTL1ACP1KMT2AMEN1ALDH1A1 | |
| SCHEMBL15362352 | 0.89 | KDM4E (0.41) | L3MBTL1ACP1KMT2AMEN1ALDH1A1 | |
| SCHEMBL31055391 | 0.89 | ADORA2A (0.53) | L3MBTL1ACP1KMT2AMEN1ALDH1A1 | |
| SCHEMBL13140697 | 0.89 | ADORA2A (0.53) | L3MBTL1ACP1KMT2AMEN1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023145537-A1 | PHOTOSENSITIVE RESIN COMPOSITION SET, OPTICAL WAVEGUIDE AND METHOD FOR PRODUCING SAME, PHOTOELECTRIC HYBRID BOARD, SHEET SET, RESIN COMPOSITION FOR CORES, RESIN COMPOSITION FOR CLADDINGS, AND RESIN SHEET | 味の素株式会社 | 2023-08-03 | — | — | WO | disclosed |
| WO-2022264934-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND DISPLAY DEVICE | 東レ株式会社 | 2022-12-22 | — | — | WO | disclosed |
| US-11180585-B2 | Film touch sensor and structure including the same | DONGWOO FINE-CHEM CO., LTD. (KR) | 2021-11-23 | — | — | US | disclosed |
| US-20210277156-A1 | FILM TOUCH SENSOR AND STRUCTURE INCLUDING THE SAME | DONGWOO FINE-CHEM CO., LTD. (KR) | 2021-09-09 | — | — | US | disclosed |
| US-20200326623-A1 | A NEGATIVE TONE LIFT OFF RESIST COMPOSITION COMPRISING AN ALKALI SOLUBLE RESIN AND CROSS LINKERS AND A METHOD FOR MANUFACTURING METAL FILM PATTERNS ON A SUBSTRATE | MERCK PATENT GMBH (DE) | 2020-10-15 | — | — | US | disclosed |
| US-10429753-B2 | Electrophotographic photoconductor, process cartridge, and electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 2019-10-01 | — | — | US | disclosed |
| US-9405188-B2 | Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device | SAMSUNG SDI CO., LTD. (KR) | 2016-08-02 | — | — | US | disclosed |
| US-9405188-B2 | Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device | SAMSUNG SDI CO., LTD. (KR) | 2016-08-02 | — | — | US | disclosed |
| US-9214345-B2 | Film-forming composition and ion implantation method | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-12-15 | — | — | US | disclosed |
| US-9214345-B2 | Film-forming composition and ion implantation method | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-12-15 | — | — | US | disclosed |
| EP-0497342-B1 | Negative photoresist composition | SUMITOMO CHEMICAL CO (JP) | 1998-08-05 | — | — | EP | disclosed |
| WO-1997031073-A1 | COATING COMPOSITION COMPRISING A BICYCLO- OR SPIRO-ORTHOESTER-FUNCTIONAL COMPOUND | AKZO NOBEL N.V. (NL) | 1997-08-28 | — | — | WO | disclosed |
| US-5304456-A | Negative photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-04-19 | — | — | US | disclosed |
| EP-0497342-A2 | Negative photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-08-05 | — | — | EP | disclosed |
| US-4536420-A | COATING WITH CARBOXYLIC ACID FUNCTIONAL POLYMER AND HYDROXYLATED SILICA, AND CURING; HEAT EXCHANGERS; EVAPORATORS; DRAINAGE | GENERAL ELECTRIC COMPANY (US) | 1985-08-20 | — | — | US | disclosed |
| US-4204014-A | BINDER, AMINOPLAST, LOW MOLECULAR WEIGHT POLYESTER OF ETHYLENE AND PROPYLENE GLYCOLS WITH TEREPHTHALIC ACND HEXAHYDROTEREPHTHALIC ACIDS | CHEMISCHE WERKE HUELS, AG (DE) | 1980-05-20 | — | — | US | disclosed |
| US-4101496-A | AMINO RESINS, POLYESTERS | CHEMISCHE WERKE HULS AKTIENGESELLSCHAFT (DE) | 1978-07-18 | — | — | US | disclosed |
| US-4057523-A | MELAMINE OR GUANAMINE RESIN | AMERICAN CYANAMID COMPANY (US) | 1977-11-08 | — | — | US | disclosed |
| US-3984382-A | AMINO ALCOHOLS, DIFUNCTIONAL AMINES, MONOEPOXIDE | AMERICAN CYANAMID COMPANY (US) | 1976-10-05 | — | — | US | disclosed |
| US-3965058-A | AMINE-ALDEHYDE THERMOSETTING RESIN | PPG INDUSTRIES, INC. (US) | 1976-06-22 | — | — | US | disclosed |