⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL789876 | 0.93 | — | — | |
| Hydrochloric Acid SCHEMBL2798786 | 0.86 | — | — | |
| SCHEMBL144817 | 0.77 | — | — | |
| SCHEMBL3914831 | 0.76 | — | — | |
| SCHEMBL25283357 | 0.72 | — | — | |
| Ammonia Solution, Strong SCHEMBL2314527 | 0.68 | — | — | |
| SCHEMBL21527936 | 0.67 | — | — | |
| SCHEMBL21527930 | 0.67 | — | — | |
| SCHEMBL316487 | 0.67 | — | — | |
| SCHEMBL5415472 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8512587-B2 | Highly selective doped oxide etchant | MICRON TECHNOLOGY, INC. (US) | 2013-08-20 | — | — | US | disclosed |
| CN-101390200-A | Highly selective doped oxide etchant | MICRON TECHNOLOGY INC (US) | 2009-03-18 | — | — | CN | disclosed |
| EP-1994556-A2 | HIGHLY SELECTIVE DOPED OXIDE ETCHANT | Micron Technology, Inc. (US) | 2008-11-26 | — | — | EP | disclosed |
| US-20070262048-A1 | Highly Selective Doped Oxide Etchant | MICRON SEMICONDUCTOR PRODUCTS, INC. | 2007-11-15 | — | — | US | disclosed |
| WO-2007100544-A2 | HIGHLY SELECTIVE DOPED OXIDE ETCHANT | MICRON TECHNOLOGY, INC. (US) | 2007-09-07 | — | — | WO | disclosed |
| US-20070207622-A1 | Highly selective doped oxide etchant | MICRON TECHNOLOGY, INC. (US) | 2007-09-06 | — | — | US | disclosed |