⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL789876 | 0.83 | — | — | |
| SCHEMBL28168337 | 0.77 | — | — | |
| Ammonia Solution, Strong SCHEMBL4710472 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL2798786 | 0.77 | — | — | |
| SCHEMBL4814339 | 0.72 | — | — | |
| SCHEMBL27798232 | 0.72 | — | — | |
| SCHEMBL21527936 | 0.72 | — | — | |
| SCHEMBL21527930 | 0.72 | — | — | |
| SCHEMBL316487 | 0.72 | — | — | |
| SCHEMBL3914831 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240191346-A1 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | VERSUM MAT US LLC (US) | 2024-06-13 | — | — | US | claimed |
| CN-118007094-A | Halosilane compounds and compositions and methods for depositing silicon-containing films using the same | 弗萨姆材料美国有限责任公司 | 2024-05-10 | — | — | CN | claimed |
| US-11913112-B2 | Processes for depositing silicon-containing films using halidosilane compounds and compositions | VERSUM MATERIALS US, LLC (US) | 2024-02-27 | — | — | US | claimed |
| EP-4092154-A1 | PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | Versum Materials US, LLC (US) | 2022-11-23 | — | — | EP | claimed |
| EP-3310942-B1 | PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS | VERSUM MAT US LLC (US) | 2022-07-13 | — | — | EP | claimed |
| US-20220154331-A1 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | VERSUM MATERIALS US, LLC (US) | 2022-05-19 | — | — | US | claimed |
| US-11268190-B2 | Processes for depositing silicon-containing films using halidosilane compounds | VERSUM MATERIALS US, LLC (US) | 2022-03-08 | — | — | US | claimed |
| US-12424658-B2 | Electrolyte for lithium secondary battery and lithium secondary battery comprising same | SAMSUNG SDI CO., LTD. (KR) | 2025-09-23 | — | — | US | disclosed |
| US-20240191346-A1 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | VERSUM MAT US LLC (US) | 2024-06-13 | — | — | US | disclosed |
| US-20240191346-A1 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | VERSUM MAT US LLC (US) | 2024-06-13 | — | — | US | disclosed |
| CN-118007094-A | Halosilane compounds and compositions and methods for depositing silicon-containing films using the same | 弗萨姆材料美国有限责任公司 | 2024-05-10 | — | — | CN | disclosed |
| CN-118007094-A | Halosilane compounds and compositions and methods for depositing silicon-containing films using the same | 弗萨姆材料美国有限责任公司 | 2024-05-10 | — | — | CN | disclosed |
| US-11913112-B2 | Processes for depositing silicon-containing films using halidosilane compounds and compositions | VERSUM MATERIALS US, LLC (US) | 2024-02-27 | — | — | US | disclosed |
| EP-3310942-B1 | PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS | VERSUM MAT US LLC (US) | 2022-07-13 | — | — | EP | disclosed |
| US-20220154331-A1 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | VERSUM MATERIALS US, LLC (US) | 2022-05-19 | — | — | US | disclosed |
| US-20220154331-A1 | HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME | VERSUM MATERIALS US, LLC (US) | 2022-05-19 | — | — | US | disclosed |
| US-11268190-B2 | Processes for depositing silicon-containing films using halidosilane compounds | VERSUM MATERIALS US, LLC (US) | 2022-03-08 | — | — | US | disclosed |
| US-11268190-B2 | Processes for depositing silicon-containing films using halidosilane compounds | VERSUM MATERIALS US, LLC (US) | 2022-03-08 | — | — | US | disclosed |
| US-8778690-B2 | Porous optical sensor with fiducial marker and method for detection of analytes | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2014-07-15 | — | — | US | disclosed |
| US-20120058567-A1 | POROUS OPTICAL SENSOR WITH FIDUCIAL MARKER AND METHOD FOR DETECTION OF ANALYTES | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2012-03-08 | — | — | US | disclosed |