Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4700295 | 0.89 | CYP19A1 (0.31) | CYP19A1 | |
| SCHEMBL7116412 | 0.83 | CYP19A1 (0.35) | CYP19A1 | |
| SCHEMBL218876 | 0.83 | CYP19A1 (0.36) | CYP19A1 | |
| SCHEMBL28451456 | 0.83 | CYP19A1 (0.36) | CYP19A1 | |
| SCHEMBL5057907 | 0.83 | CYP19A1 (0.36) | CYP19A1 | |
| SCHEMBL5620922 | 0.81 | CYP19A1 (0.36) | CYP19A1 | |
| SCHEMBL612395 | 0.81 | CYP19A1 (0.36) | CYP19A1 | |
| SCHEMBL2000716 | 0.81 | CYP19A1 (0.36) | CYP19A1 | |
| SCHEMBL8986151 | 0.81 | CYP19A1 (0.36) | CYP19A1 | |
| SCHEMBL6283349 | 0.79 | CYP19A1 (0.35) | CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025070154-A1 | POLYAMIDE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, AND ELECTRONIC COMPONENT | 東レ株式会社 | 2025-04-03 | — | — | WO | disclosed |
| CN-112812139-A | Asymmetric cobaltocene cation derivative and preparation method thereof | 西北工业大学 | 2021-05-18 | — | — | CN | disclosed |
| EP-3450482-B1 | HIGH-STRENGTH TRANSPARENT POLYAMIDE-IMIDE AND METHOD FOR MANUFACTURING SAME | LG CHEMICAL LTD (KR) | 2021-03-03 | — | — | EP | disclosed |
| CN-105607426-B | Polymer, chemical amplification negative resist composition and pattern forming method | SHIN ETSU CHEMICAL COMPANY (JP) | 2019-11-01 | — | — | CN | disclosed |
| US-20190010292-A1 | HIGH-STRENGTH TRANSPARENT POLYAMIDE-IMIDE AND METHOD FOR MANUFACTURING SAME | LG CHEM, LTD. (KR) | 2019-01-10 | — | — | US | disclosed |
| EP-2413192-B1 | POLYMERIZABLE MONOMERS | SHINETSU CHEMICAL CO (JP) | 2016-12-21 | — | — | EP | disclosed |
| US-9519216-B2 | Positive photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2016-12-13 | — | — | US | disclosed |
| EP-2412733-B1 | Polymer, chemically amplified negative resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| EP-1609024-B1 | PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-09-30 | — | — | EP | disclosed |
| EP-1636648-B1 | NOVEL POSITIVE PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-08-12 | — | — | EP | disclosed |
| US-20040068124-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-04-08 | — | — | US | disclosed |
| EP-1403295-A2 | Ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6653048-B2 | Radiation sensitive bilayer resists which are used in manufacture of integrated circuits | INTERNATIONAL BUSINESS MACHINES CORP. | 2003-11-25 | — | — | US | disclosed |
| US-20030134226-A1 | Polybenzoxazoles from poly-o-hydroxyamide, novel poly-o-hydroxyamides, preparation processes therefor, and their application in microelectronics | POLARIS INNOVATIONS LIMITED (IE) | 2003-07-17 | — | — | US | disclosed |
| US-20030087190-A1 | Photosensitive formulation for buffer coatings, film including the formulation, and method for manufacturing electronics using the formulation | SEZI RECAI (DE) | 2003-05-08 | — | — | US | disclosed |
| US-20020127490-A1 | High silicon content monomers and polymers suitable for 193 nm bilayer resists | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2002-09-12 | — | — | US | disclosed |
| US-6444408-B1 | High silicon content monomers and polymers suitable for 193 nm bilayer resists | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-09-03 | — | — | US | disclosed |
| US-5182360-A | Crosslinking agent | LOCTITE CORPORATION (US) | 1993-01-26 | — | — | US | disclosed |
| US-4994535-A | Molding material | HERCULES INCORPORATED (US) | 1991-02-19 | — | — | US | disclosed |
| EP-0283719-A2 | Metathesis polymerized cross-linked halogen-containing copolymer | HERCULES INCORPORATED (US) | 1988-09-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040068124-A1 | Novel ester compounds, polymers, resist compositions and patterning process | DHCR24, EEF1D, MUS81 | CYP19A1 606/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.