⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11321333 | 0.82 | — | — | |
| SCHEMBL164603 | 0.71 | — | — | |
| SCHEMBL375923 | 0.71 | — | — | |
| SCHEMBL164602 | 0.71 | — | — | |
| SCHEMBL351949 | 0.71 | — | — | |
| SCHEMBL25421788 | 0.69 | — | — | |
| SCHEMBL14826506 | 0.69 | GABRP (0.47) | — | |
| Hydrochloric Acid SCHEMBL20532011 | 0.69 | — | — | |
| SCHEMBL4524661 | 0.69 | — | — | |
| SCHEMBL19286787 | 0.69 | CRBN (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0028204-B1 | PRE-EXTENDED ETHERIFIED AMINOPLAST RESINS, PROCESS FOR THEIR PREPARATION AND THEIR USE IN SURFACE COATINGS | CIBA-GEIGY AG (CH) | 1984-02-29 | — | — | EP | claimed |
| US-4361594-A | COATINGS | CIBA-GEIGY CORPORATION (US) | 1982-11-30 | — | — | US | claimed |
| EP-0028204-A2 | Pre-extended etherified aminoplast resins, process for their preparation and their use in surface coatings | CIBA-GEIGY AG (CH) | 1981-05-06 | — | — | EP | claimed |
| US-20240366615-A1 | POLQ INHIBITORS | ASTRAZENECA UK LIMITED (GB) | 2024-11-07 | — | — | US | disclosed |
| CN-105849638-B | Active light-sensitive or radiation-sensitive resin composition and film | 富士胶片株式会社 | 2020-07-07 | — | — | CN | disclosed |
| CN-105607426-B | Polymer, chemical amplification negative resist composition and pattern forming method | SHIN ETSU CHEMICAL COMPANY (JP) | 2019-11-01 | — | — | CN | disclosed |
| EP-3106920-B1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2019-07-10 | — | — | EP | disclosed |
| US-10324374-B2 | Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound | FUJIFILM CORPORATION (JP) | 2019-06-18 | — | — | US | disclosed |
| US-RE46765-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-RE46765-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-RE46736-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| EP-0022081-B1 | POLYMERISABLE COMPOSITIONS CONTAINING SULPHOXONIUM SALTS AND PROCESS FOR THE PRODUCTION OF HIGH MOLECULAR WEIGHT PRODUCTS FROM THESE COMPOSITIONS BY IRRADIATION | CIBA-GEIGY AG (CH) | 1983-02-09 | — | — | EP | disclosed |
| US-4361594-A | COATINGS | CIBA-GEIGY CORPORATION (US) | 1982-11-30 | — | — | US | disclosed |
| US-4339567-A | Photopolymerization by means of sulphoxonium salts | CIBA-GEIGY CORPORATION (US) | 1982-07-13 | — | — | US | disclosed |
| EP-0054509-A2 | Salt of sulfoxonium as a polymerisation catalyst | CIBA-GEIGY AG (CH) | 1982-06-23 | — | — | EP | disclosed |
| EP-0044274-A2 | Photopolymerisation by means of carbamoylsulfoxonium salts | CIBA-GEIGY AG (CH) | 1982-01-20 | — | — | EP | disclosed |
| US-4299592-A | Printing of textile materials | BASF AKTIENGESELLSCHAFT (DE) | 1981-11-10 | — | — | US | disclosed |
| EP-0035969-A1 | Composition of cationically polymerisable material and a catalyst | CIBA-GEIGY AG (CH) | 1981-09-16 | — | — | EP | disclosed |
| EP-0028204-A2 | Pre-extended etherified aminoplast resins, process for their preparation and their use in surface coatings | CIBA-GEIGY AG (CH) | 1981-05-06 | — | — | EP | disclosed |
| EP-0022081-A1 | Polymerisable compositions containing sulphoxonium salts and process for the production of high molecular weight products from these compositions by irradiation | CIBA-GEIGY AG (CH) | 1981-01-07 | — | — | EP | disclosed |