⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13178314 | 0.71 | — | — | |
| SCHEMBL6752598 | 0.70 | — | — | |
| SCHEMBL19069177 | 0.70 | — | — | |
| SCHEMBL5930994 | 0.69 | AURKA (0.33) | — | |
| SCHEMBL579509 | 0.65 | — | — | |
| SCHEMBL22017493 | 0.65 | — | — | |
| SCHEMBL9936611 | 0.65 | — | — | |
| SCHEMBL28253550 | 0.64 | — | — | |
| SCHEMBL1062527 | 0.63 | — | — | |
| SCHEMBL13090048 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105849638-B | Active light-sensitive or radiation-sensitive resin composition and film | 富士胶片株式会社 | 2020-07-07 | — | — | CN | disclosed |
| EP-2413192-B1 | POLYMERIZABLE MONOMERS | SHINETSU CHEMICAL CO (JP) | 2016-12-21 | — | — | EP | disclosed |
| US-20160280621-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | FUJIFILM CORPORATION (JP) | 2016-09-29 | — | — | US | disclosed |
| EP-2412733-B1 | Polymer, chemically amplified negative resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| US-8501942-B2 | Polymerizable monomers | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| US-8470512-B2 | Polymer, chemically amplified negative resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-20120028190-A1 | POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120029193-A1 | POLYMERIZABLE MONOMERS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-02 | — | — | US | disclosed |
| EP-2413192-A1 | Polymerizable monomers | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-02-01 | — | — | EP | disclosed |
| EP-2412733-A1 | Polymer, chemically amplified negative resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-02-01 | — | — | EP | disclosed |
| JP-2001316374-A | METHOD FOR PRODUCING 5-HYDROXY-TETRAHYDRO-2- PYRIMIDINONE | NISSAN CHEM IND LTD | 2001-11-13 | — | — | JP | disclosed |