SCHEMBL471892

SCHEMBL471892

CCOC(=O)C(C)O.CCOC(=O)C(C)O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.50
LMNA P02545 1/20 0.48
HSD17B10 Q99714 1/20 0.48
ALOX15 P16050 1/20 0.46
MGAM O43451 1/20 0.46
GAA P10253 1/20 0.46
SI P14410 1/20 0.46
MGAM2 Q2M2H8 1/20 0.46
SOAT1 P35610 1/20 0.46
TRPA1 O75762 1/20 0.42
TP53 P04637 1/20 0.40
PIN1 Q13526 1/20 0.38
HPGD P15428 1/20 0.37
HCAR2 Q8TDS4 1/20 0.37
METAP2 P50579 1/20 0.37
METAP1 P53582 1/20 0.37
MEN1 O00255 1/20 0.36
NPC1 O15118 1/20 0.36
KMT2A Q03164 1/20 0.36
CAD P27708 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL344175 1.00
SCHEMBL29615225 1.00
SCHEMBL284806 1.00
SCHEMBL22598 1.00
Hydrochloric Acid SCHEMBL2655388 0.97
Methyl Alcohol SCHEMBL6027936 0.97 ALDH1A1 (0.48) ALDH1A1LMNAHSD17B10ALOX15MGAM
Propane SCHEMBL9159399 0.97 ALDH1A1 (0.48) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL5605429 0.97
Ammonia Solution, Strong SCHEMBL6891050 0.97
Isopropyl Alcohol SCHEMBL1972398 0.97 ALDH1A1 (0.48) ALDH1A1LMNAHSD17B10ALOX15MGAM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110253171-A1 Chemical Composition and Methods for Removing Epoxy-Based Photoimageable Coatings Utilized In Microelectronic Fabrication MOORE JOHN 2011-10-20 US claimed
US-11807768-B2 Inkjet ink, hiding layer coating agent, recording sheet and method for manufacturing the same, recorded product and method for manufacturing the same, and image recording ink GENERAL CO., LTD. (JP) 2023-11-07 US disclosed
US-11680178-B2 Inkjet ink GENERAL CO., LTD. (JP) 2023-06-20 US disclosed
CN-114432175-A Pet skin care agent 佛山市佛丹动物药业有限公司 2022-05-06 CN disclosed
EP-3838996-A1 INKJET INK General Co., Ltd. (JP) 2021-06-23 EP disclosed
US-20210179874-A1 INKJET INK General Co., Ltd., Osaka, JAPAN 2021-06-17 US disclosed
CN-110327468-A Isoxazoline composition and its purposes in the parasitic infestation for preventing or treating animal 英特维特国际股份有限公司 2019-10-15 CN disclosed
CN-108200879-A A kind of high-volume crayfish culture device 兰溪市普润斯水产养殖技术有限公司 2018-06-26 CN disclosed
CN-105813651-A Isoxazoline compositions and their use in preventing or treating parasitic infestations of animals 英特维特国际股份有限公司 2016-07-27 CN disclosed
US-8957007-B2 Aluminum safe compositions for removing cured polysulfide resins MOORRE JOHN CLEAON (US) 2015-02-17 US disclosed
EP-2411874-A1 COMPOSITIONS AND METHODS FOR REMOVING ORGANIC SUBSTANCES Eastman Chemical Company (US) 2012-02-01 EP disclosed
EP-2411499-A2 COMPOSITIONS AND METHODS FOR REMOVING ORGANIC SUBSTANCES Eastman Chemical Company (US) 2012-02-01 EP disclosed
US-20110253171-A1 Chemical Composition and Methods for Removing Epoxy-Based Photoimageable Coatings Utilized In Microelectronic Fabrication MOORE JOHN 2011-10-20 US disclosed
EP-2359191-A1 CARRIER SOLVENT COMPOSITIONS, COATINGS COMPOSITIONS, AND METHODS TO PRODUCE THICK POLYMER COATINGS Eastman Chemical Company (US) 2011-08-24 EP disclosed
US-20110165772-A1 CARRIER SOLVENT COMPOSITIONS, COATINGS COMPOSITIONS, AND METHODS TO PRODUCE THICK POLYMER COATINGS EASTMAN CHEMICAL COMPANY (US) 2011-07-07 US disclosed
CN-101560457-A Health foodgrain wine and preparation method thereof ENGLAND SPH CORP (VG) 2009-10-21 CN disclosed
CN-100474520-C Lactate-containing corrosion inhibitor INTEL CORP (US) 2009-04-01 CN disclosed
CN-1961409-A Lactate-containing corrosion inhibitor INTEL CORP (US) 2007-05-09 CN disclosed
CN-1584742-A Positive light sensitive resin composition QIMEI IND CO LTD (CN) 2005-02-23 CN disclosed
US-6733949-B2 ACID AND ALKALI ETCHING RESISTANT PROTECTIVE LAYER; IMAGE FORMATION OF MICROELECTRONIC DEVICE CLARIANT FINANCE (BVI) LIMITED (VG) 2004-05-11 US disclosed